IP Library Granted Patent US 6,939,821
Granted Patent B2
US 6,939,821 · App. 10/164,238 · Granted Sep 6, 2005

Low resistivity silicon carbide

Assignee: Shipley Company, L.L.C.
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Quick Facts
Patent No.
US 6,939,821
App. No.
10/164,238
Granted
Sep 6, 2005
Kind
B2
Abstract

An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.

Claims (10)

1. A free-standing article of CVD silicon carbide comprising greater than 3×10 19 atoms of nitrogen/cm 3 and an electrical resistivity of less than 0.10 ohm-cm, the free standing article of CVD silicon carbide is made from precursors at temperatures from 1250° C. to 1400° C.

2. The article of claim 1 , wherein the CVD silicon carbide has from 5×10 19 to 1×10 20 nitrogen atoms/cm 3 .

3. The article of claim 1 , wherein the CVD silicon carbide has from 7×10 19 to 1×10 20 nitrogen atoms/cm 3 .

4. The article of claim 1 , wherein the CVD silicon carbide has an electrical resistivity of from 0.10 ohm-cm to 0.08 ohm-cm.

5. The article of claim 1 , wherein the CVD silicon carbide has an average electrical resistivity is from 0.02 ohm-cm to 0.06 ohm-cm.

6. The article of claim 1 , wherein the CVD silicon carbide is opaque to light at a wavelength of from 0.1 μm to 1.0 μm.

7. The article of claim 1 , wherein the CVD silicon carbide article is an edge ring, plasma screen or liner.

8. The article of claim 1 , wherein the CVD silicon carbide has an absorption coefficient of from 259 cm −1 to 1000 cm −1 .

9. The article of claim 1 , wherein the variation around the mean of the electrical resistivity is from 25% to 30%.

10. The article of claim 6 , wherein the article is opaque to the light temperatures of from 20° C. to 1475° C.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 7, 2016
From: ROHM AND HAAS COMPANY
To: TOKAI CARBON CO., LTD.
Reel/Frame 039660/0746 →
CORRECTED RECORDATION FORM COVER SHEET TO CORRECT NAME AND ADDRESS OF RECEIVING PARTY. PREVIOUSLY RECORDED AT REEL/FRAME 012984/0234 (ASSIGNMENT OF ASSIGNOR'S INTEREST) Recorded Sep 18, 2002
From: GOELA, JITENDRA S.; PICKERING, MICHAEL A.
To: ROHM AND HAAS COMPANY
Reel/Frame 013317/0956 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 6, 2002
From: GOELA, JITENDRA S.; PICKERING, MICHAEL A.
To: SHIPLEY COMPANY, L.L.C.
Reel/Frame 012984/0234 →
Continuity (3)
Continuation In Part 0979044200 · Feb 21, 2001
Provisional Application 6018476600 · Feb 24, 2000
Related Publication 20030036471A1 · Feb 20, 2003