IP Library Granted Patent US 6,907,176
Granted Patent B2
US 6,907,176 · App. 10/178,975 · Granted Jun 14, 2005

Planar optical waveguide assembly and method of preparing same

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Quick Facts
Patent No.
US 6,907,176
App. No.
10/178,975
Granted
Jun 14, 2005
Kind
B2
Abstract

A method of preparing a planar optical waveguide assembly, comprising the steps of: (i) applying a silicone composition to a surface of a substrate to form a silicone film; (ii) exposing at least one selected region of the silicone film to radiation having a wavelength of from 150 to 800 nm to produce a partially exposed film having at least one exposed region and at least one non-exposed region; (iii) removing the non-exposed region of the partially exposed film with a developing solvent to form a patterned film; and (iv) heating the patterned film for an amount of time sufficient to form at least one silicone core having a refractive index of from 1.3 to 1.7 at 23° C. for light having a wavelength of 589 nm; wherein the substrate has a refractive index less than the refractive index of the silicone core. A planar optical waveguide assembly prepared according to the method of the invention.

Claims (21)

1. A planar optical waveguide assembly prepared by a method comprising the steps of:

(i) applying a silicone composition to a surface of a substrate to form a silicone film, wherein the silicone composition comprises;

(A) an organopolysiloxane containing an average of at least two silicon-bonded alkenyl groups per molecule,

(B) an organosilicon compound containing an average of at least two silicon-bonded hydrogen atoms per molecule in a concentration sufficient to cure the composition, and

(C) a catalytic amount of a photoactivated hydrosilylation catalyst;

(ii) exposing at least one selected region of the silicone film to radiation having a wavelength of from 150 to 800 nm to produce a partially exposed film having at least one exposed region and at least one non-exposed region;

(iii) removing the non-exposed region of the partially exposed film with a developing solvent to form a patterned film; and

(iv) heating the patterned film for an amount of time sufficient to form at least one silicone core having a refractive index of from 1.3 to 1.7 at 23° C. for light having a wavelength of 589 nm; wherein the substrate has a refractive index less than the refractive index of the silicone core.

2. The planar optical waveguide assembly according to claim 1 , wherein the organopolysiloxane is an organopolysiloxane resin.

3. The planar optical waveguide assembly according to the method of claim 1 , wherein the method further comprises (v) covering the substrate and the silicone core with a curable polymer composition to form a polymer film and (vi) curing the polymer film to form a clad layer, wherein the clad layer has a refractive index less than the refractive index of the silicone core.

4. A planar optical waveguide assembly, prepared by a method comprising the steps of:

(i) applying a silicone composition to a surface of a substrate to form a silicone film, wherein the silicone composition comprises;

(A) an organopolysiloxane containing an average of at least two silicon-bonded alkenyl groups per molecule.

(B) an organosilicon compound containing an average of at least two silicon-bonded hydrogen atoms per molecule in a concentration sufficient to cure the composition, and

(C) a catalytic amount of a photoactivated hydrosilylation catalyst;

(ii) exposing at least one selected region of the silicone film to radiation having a wavelength of from 150 to 800 nm to produce a partially exposed film having at least one exposed region and at least one non-exposed region;

(iii) heating the partially exposed film for an amount of time such that the exposed region is substantially insoluble in a developing solvent and the non-exposed region is soluble in the developing solvent;

(iv) removing the non-exposed region of the heated film with the developing solvent to form a patterned film; and

(v) heating the patterned film for an amount of time sufficient to form at least one silicone core having a refractive index of from 1.3 to 1.7 at 23° C. for light having a wavelength of 589 nm; wherein the substrate has a refractive index less than the refractive index of the silicone core.

5. The planar optical waveguide assembly according to claim 4 , wherein the organopolysiloxane is an organopolysiloxane resin.

6. The planar optical waveguide assembly according to claim 4 , wherein the method further comprises (vi) covering the substrate and the silicone core with a curable polymer composition to form a polymer film and (vii) curing the polymer film to form a clad layer, wherein the clad layer has a refractive index less than the refractive index of the silicone core.

Assignments (2)
CHANGE OF NAME Recorded Feb 27, 2018
From: DOW CORNING CORPORATION
To: DOW SILICONES CORPORATION
Reel/Frame 045460/0278 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 7, 2004
From: GARDNER, GEOFFREY BURCE; SCHMIDT, RANDALL GENE
To: DOW CORNING CORPORATION
Reel/Frame 015876/0434 →