IP Library › Granted Patent US 6,620,565
Granted Patent Utility
US 6,620,565 · Confirmation No. 1555

ELECTRON BEAM LITHOGRAPHY APPARATUS FOCUSED THROUGH SPHERICAL ABERRATION INTRODUCTION

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 Code Description Pages PDF
2002-07-03 TRNA Transmittal of New Application 2 View
2002-07-03 A.PE Preliminary Amendment 2 View
2002-07-03 SPEC Specification 9 View
2002-07-03 CLM Claims 2 View
2002-07-03 ABST Abstract 1 View
2002-07-03 DRW Drawings-only black and white line drawings 14 View
2002-07-03 OATH Oath or Declaration filed 15 View
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Quick Facts
Patent No.
US 6,620,565
App. No.
10/188,030
Filed
2002-07-03
Granted
2003-09-16
Pub. No.
US20030022077A1
Art Unit
1756
PTA
-48 days