Free radically polymerizable coupling agents
View Patent ↗In accordance with the present invention, there are provided novel coupling agents which are compatible with a wide variety of adhesive formulations and which provide substantial adhesion enhancement relative to base formulations to which they are added. Invention compounds comprise at least one free-radically polymerizable group (other than acrylate) and at least one reactive moiety which forms covalent bond(s) with substrates having free hydroxyl groups on the surface thereof. Thus, invention compounds are covalently linked to adhesive formulations upon free radical cure, while at the same time providing “residual” functionality which is capable of undergoing reaction with any substrate having reactive (e.g., hydroxyl) groups in the surface thereof.
1. A free-radically polymerizable compound having the structure:
A a -L-Z b
wherein:
each A is independently a free-radically polymerizable group selected from the group consisting of an optionally substituted maleimide, an optionally substituted vinyl ether, an optionally substituted vinyl thioether, an optionally substituted vinyl ester, an optionally substituted fumarate, an optionally substituted vinyl thioester, an optionally substituted diallylamide, an optionally substituted styrenyl, and a norbornyl, and at least one A is alkyl substituted maleimide,
each L is independently a covalent bond or a polyvalent organic radical,
each Z is a chelating group and is independently a moiety reactive with hydroxyl groups, and at least one Z is a silicate ester,
a is 1–200, and
b is 1–200,
wherein said compound, when added to a free-radically polymerizable adhesive in an adhesion enhancing amount, enhances the adhesion of said adhesive to a substrate by at least 83%.
2. A compound according to claim 1 wherein said silicate ester has the structure:
—Si(OR 1 ) 3-x R 2 x
wherein:
each R 1 is independently an optionally substituted alkyl or aryl,
each R 2 is independently an optionally substituted alkyl or aryl, halogen, and
x=0, 1 or 2.
3. A compound according to claim 1 , wherein L is a covalent bond.
4. A compound according to claim 1 , wherein L is an organic radical having up to 500 atoms in the backbone thereof.
5. A compound according to claim 4 wherein L is an organic radical selected from the group consisting of a straight or branched chain alkylene, alkylene oxide, alkylene amine, alkylene sulfide, alkylene ester, alkenylene, alkenylene oxide, alkenylene amine, alkenylene sulfide, alkenylene ester, arylene, arylene oxide, arylene amine, arylene sulfide, arylene ester, and polysiloxane.
6. A compound according to claim 1 , wherein Z is —Si(OR 1 ) 3 , and wherein each R 1 is independently lower alkyl.
7. A compound according to claim 1 , wherein Z is —Si(OR 1 ) 2 R 2 , wherein each R 1 is independently lower alkyl, and wherein R 2 is halogen or lower alkyl.
8. A compound according to claim 1 , wherein Z is —Si(OR 1 )R 2 2 , wherein R 1 is lower alkyl, and wherein each R 2 is independently halogen or lower alkyl.
9. A compound according to claim 1 , wherein a is 1–100.
10. A compound according to claim 9 , wherein a is 1–20.
11. A compound according to claim 1 , wherein b is 1–100.
12. A compound according to claim 11 , wherein b is 1–20.
13. A free-radically polymerizable compound in a curable composition having the structure:
A a -L-Z b
wherein:
each A is independently a free-radically polymerizable group selected from the group consisting of an optionally substituted maleimide, an optionally substituted vinyl ether, an optionally substituted vinyl thioether, an optionally substituted vinyl ester, an optionally substituted fumarate, an optionally substituted vinyl thioester, an optionally substituted diallylamide, an optionally substituted styrenyl, and a norbornyl,
each L is independently a covalent bond or a polyvalent organic radical,
each Z is independently a chelating group moiety reactive with hydroxyl groups selected from the group consisting of a phosphine, a mercaptan and an acetoacetate,
a is 1–200, and
b is 1–200.