IP Library › Granted Patent US 6,707,255
Granted Patent Utility
US 6,707,255 · Confirmation No. 6340

MULTIRATE PROCESSING FOR METROLOGY OF PLASMA RF SOURCE

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 Code Description Pages PDF
2003-12-17 IFEE Issue Fee Payment (PTO-85B) 1 View
2003-12-17 LET. Miscellaneous Incoming Letter 3 View
2003-12-16 A.NA Amendment after Notice of Allowance (Rule 312) 2 View
2003-12-16 CLM Claims 8 View
2003-12-16 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2003-11-14 LET. Miscellaneous Incoming Letter 1 View
2003-11-14 DRW Drawings-only black and white line drawings 5 View
2002-07-10 TRNA Transmittal of New Application 2 View
2002-07-10 SPEC Specification 12 View
2002-07-10 CLM Claims 10 View
2002-07-10 ABST Abstract 1 View
2002-07-10 DRW Drawings-only black and white line drawings 3 View
2002-07-10 OATH Oath or Declaration filed 3 View
2002-07-10 LET. Miscellaneous Incoming Letter 1 View
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Quick Facts
Patent No.
US 6,707,255
App. No.
10/192,196
Filed
2002-07-10
Granted
2004-03-16
Pub. No.
US20040007984A1
Art Unit
2821
PTA
-125 days