Measurement head for atomic force microscopy and other applications
View Patent ↗An improvement for atomic force microscopes, more generally for light beam detecting systems, but also in part applicable to scanning probe microscopes, providing significant novel features and advantages. Particular features include using different objective lens regions for incident and reflected light, a flexure that allows three dimensional motion of the optics block, forming the housing and optics block of a composite material or ceramic, arranging the components so that the beam never hits a flat surface at normal incidence, and providing a resonant frequency of cantilever vibration greater than 850 HZ between the cantilever and sample and the cantilever and focusing lens.
1. In a measurement head having a housing, a cantilever that can be positioned over a sample, and an optical system to direct a light beam from a light source as an incident beam on the surface of the cantilever, and as a reflected beam from the cantilever to an optical detector, the improvement comprising at least one of the following:
(a) a lens for focusing the incident beam onto said cantilever wherein the central axis of said incident beam is offset from the central axis of the reflected beam and each is offset from the central axis of said focusing lens;
(b) an integral optics block containing said optical system is provided in said housing, and a flexure is provided mounting the optics block to the housing while allowing the optics block to be translated along the axis of the light beam from the light source;
(c) said housing and optics block are formed of composite material or of a ceramic, having the stiffness, low thermal expansion, or both, of a ceramic; or
(d) the resonant frequency of vibration of a mechanical path between the cantilever and a sample or between the cantilever and the focusing lens system is greater than about 850 Hz.
2. An atomic force microscope, comprising:
a housing;
a cantilever that can be positioned over a sample;
an optical system for measuring deflection of the cantilever in which a light beam is focused by a lens to a spot on the cantilever; and
wherein the resonant frequency of a mechanical path between the cantilever and said sample or between the cantilever and said focusing lens is greater than about 850 Hz.
3. The atomic force microscope of claim 2 further comprising:
a scanner for supporting the sample for the cantilever; and
a cantilever holder connected to said housing and kinematically indexed directly to said scanner.
4. The atomic force microscope of claim 2 wherein the resonant frequency of at least one of said mechanical paths is greater than 5 kHz.
5. The atomic force microscope of claim 2 wherein the resonant frequency of at least one of said mechanical paths is greater than 10 kHz.
6. The atomic force microscope of claim 2 wherein the resonant frequency of at least one of said mechanical paths is greater than 20 kHz.
7. The atomic force microscope of claim 2 wherein the resonant frequency of at least one of said mechanical paths is greater than 2 kHz.
8. In a method for operating an atomic force microscope having a housing and an optical system to direct a light beam from a light source as an incident beam to the surface of a cantilever, and as a reflected beam from the cantilever to an optical detector, the improvement comprising at least one of the following steps:
(a) passing the incident beam through a first region of a lens to focus the incident beam onto the cantilever and passing the reflected beam through a second region of the lens to direct the reflected beam to the detector, wherein said incident beam is offset from the central axis of the reflected beam and each is offset from the central axis of said focusing lens;
(b) providing said optical system in an integral optics block in said housing and mounting the optics block to the housing using a flexure that allows the optics block to be translated along the axis of the light beam from the light source; or
(c) providing a cantilever holder for said cantilever and a scanner for supporting a sample for said cantilever; and directly kinematically mounting said cantilever holder on said scanner, whereby the resonant frequency of vibration of a mechanical path between said cantilever and a sample and/or the mechanical path between said cantilever and said focusing lens is greater than about 850 Hz.
9. In a method for operating an atomic force microscope having a housing and an optical system to direct a light beam from a light source as an incident beam to the surface of a cantilever, and as a reflected beam from the cantilever to an optical detector, the improvement comprising providing a cantilever holder for said cantilever and a scanner for supporting a sample for said cantilever; and directly kinematically mounting said cantilever holder on said scanner, whereby the resonant frequency of vibration of the mechanical path between said cantilever and said sample and/or the mechanical path between the cantilever and a detection system is greater than about 850 Hz.
10. The method of claim 9 wherein the resonant frequency of at least one of said mechanical paths is greater than 2 kHz.
11. The method of claim 9 wherein the resonant frequency of at least one of said mechanical paths is greater than 5 kHz.
12. The method of claim 9 wherein the resonant frequency of at least one of said mechanical paths is greater than 10 kHz.
13. The method of claim 9 wherein the resonant frequency of at least one of said mechanical paths is greater than 20 kHz.
14. In a method of operating a measurement head to measure the motion or position of a nanomechanical object or a nano size feature of an object, the improvement comprising the steps of constructing a mechanical path between a detection system and said nanomechanical object or nano size feature of an object such that the resonant frequency of vibration of said mechanical path is greater than 850 Hz.
15. The method of claim 14 wherein the resonant frequency of at least one of said mechanical paths is greater than 2 kHz.
16. The method of claim 14 wherein the resonant frequency of at least one of said mechanical paths is greater than 5 kHz.
17. The method of claim 14 wherein the resonant frequency of at least one of said mechanical paths is greater than 10 kHz.
18. The method of claim 14 wherein the resonant frequency of at least one of said mechanical paths is greater than 20 kHz.
19. In a method of operating a measurement head to measure the interaction between a nanomechanical object or a nano size feature of an object and a sample, the improvement comprising the steps of constructing a mechanical path between the sample and said nanomechanical object such that the resonant frequency of vibration of said mechanical path is greater than 850 Hz.
20. The method of claim 19 wherein the resonant frequency of at least one of said mechanical paths is greater than 2 kHz.
21. The method of claim 19 wherein the resonant frequency of at least one of said mechanical paths is greater than 5 kHz.
22. The method of claim 19 wherein the resonant frequency of at least one of said mechanical paths is greater than 10 kHz.
23. The method of claim 19 wherein the resonant frequency of at least one of said mechanical paths is greater than 20 kHz.