IP Library Patent Application 10206749
Patent Application Utility
App. No. 10/206,749 · Confirmation No. 8573

AFFERENT-BASED POLISHING MEDIA FOR CHEMICAL MECHANICAL PLANARIZATION

Inventor: Rodney C. Kistler
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗
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Code Description Pages PDF
2004-05-10 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-07-26 TRNA Transmittal of New Application 3 View
2002-07-26 SPEC Specification 14 View
2002-07-26 CLM Claims 3 View
2002-07-26 ABST Abstract 1 View
2002-07-26 DRW Drawings-only black and white line drawings 7 View
2002-07-26 OATH Oath or Declaration filed 2 View
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Quick Facts
App. No.
10/206,749
Filed
2002-07-26
Granted
2004-06-22
Art Unit
3723
PTA
-37 days