Patent Application
Utility
App. No. 10/212,234
· Confirmation No. 2218
Method for forming a capping layer on a copper interconnect
Inventor:
Koichi Ohto
Abandoned -- Failure to Respond to an Office Action
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2002-08-06 | TRNA |
Transmittal of New Application | 3 | View | |
| 2002-08-06 | ADS |
Application Data Sheet | 3 | View | |
| 2002-08-06 | A.PE |
Preliminary Amendment | 6 | View | |
| 2002-08-06 | SPEC |
Specification | 9 | View | |
| 2002-08-06 | CLM |
Claims | 3 | View | |
| 2002-08-06 | ABST |
Abstract | 1 | View | |
| 2002-08-06 | DRW |
Drawings-only black and white line drawings | 3 | View | |
| 2002-08-06 | OATH |
Oath or Declaration filed | 2 | View |
Inventors
Koichi Ohto
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/687
H10W20/064
H10W20/425
H10W20/077
H10P14/69433
H10W20/074
H10W20/4421
Prosecution
- Examiner
- KIELIN, ERIK J
- Art Unit
- 2813
- Customer No.
- 466
- Docket No.
- 8038-1011-1
- Confirmation No.
- 2218
Foreign Priority
11-343510
·
1999-12-02
·
JAPAN
Publication
- Pub. No.
- US20020197865A1
- Pub. Date
- 2002-12-26
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-05-13
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Quick Facts
- App. No.
- 10/212,234
- Filed
- 2002-08-06
- Pub. No.
- US20020197865A1
- Examiner
- KIELIN, ERIK J
- Art Unit
- 2813
External Links