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App. No. 10/217,236 · Confirmation No. 9493

Enhanced ion beam etch selectivity of magnetic thin films using carbon-based gases

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2005-01-03 ABN Abandonment 2 View
2005-01-03 SRFW Search information including classification, databases and other search related notes 1 View
2004-08-12 CTRS Requirement for Restriction/Election 5 View
2004-08-12 BIB Bibliographic Data Sheet 1 View
2004-02-17 LET. Miscellaneous Incoming Letter 2 View
2003-08-18 LET. Miscellaneous Incoming Letter 2 View
2003-01-22 IDS Information Disclosure Statement (IDS) Form (SB08) 4 View
2002-08-12 TRNA Transmittal of New Application 2 View
2002-08-12 ADS Application Data Sheet 2 View
2002-08-12 SPEC Specification 12 View
2002-08-12 CLM Claims 2 View
2002-08-12 ABST Abstract 1 View
2002-08-12 DRW Drawings-only black and white line drawings 6 View
2002-08-12 OATH Oath or Declaration filed 4 View
2002-08-12 WFEE Fee Worksheet (SB06) 1 View
2002-08-12 WFEE Fee Worksheet (SB06) 1 View
2002-08-12 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2002-08-12 FOR Foreign Reference 40 View
2002-08-12 FOR Foreign Reference 33 View
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Quick Facts
App. No.
10/217,236
Filed
2002-08-12
Pub. No.
US20030038106A1
Art Unit
1765