IP Library › Granted Patent US 7,038,353
Granted Patent B2
US 7,038,353 · App. 10/220,759 · Granted May 2, 2006

Surface acoustic wave device and method of manufacturing the same

Assignee: Seiko Epson Corporation
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Quick Facts
Patent No.
US 7,038,353
App. No.
10/220,759
Granted
May 2, 2006
Kind
B2
Abstract

The invention provides a piezoelectric substrate in the form of a rectangular plate in which a Rayleigh wave is propagated, and an IDT and a reflector are provided by forming interdigital electrodes on the piezoelectric substrate. At least an end face on a shorter side of the piezoelectric substrate on a top side thereof is formed as a vertical smooth surface that is substantially in parallel with a conductor strip at an end of the reflector in the position of an imaginary node of a stress wave exiting the conductor strip, thereby providing a reflecting end face to reflect the stress wave.

Claims (8)

1. A surface acoustic wave device, comprising:

a piezoelectric substrate in the form of a rectangular plate in which a Rayleigh wave is propagated, the piezoelectric substrate defining at least an end face of a shorter side; and

interdigital electrodes formed on the piezoelectric substrate to provide an IDT and a reflector, conductor strips being provided at an end of the reflector, the end face of the shorter side of the piezoelectric substrate being formed as a vertical smooth surface that is substantially in parallel with the conductor strips at the end of the reflector in a position of an imaginary node of a stress wave exiting the conductor strips, thereby providing a reflecting end face to reflect the stress wave, the reflecting end face being constituted by an inner side surface of a groove formed along the reflector and outside the reflector on a top side of the piezoelectric substrate.

2. The surface acoustic wave device according to claim 1 , the reflecting end face being provided to a depth at a predetermined distance from a top surface of the piezoelectric substrate in the position of the imaginary node of the stress wave and being configured with a step portion at a bottom end of the reflecting end face.

3. The surface acoustic wave device according to claim 1 , the reflecting end face being formed when a wafer constituting the piezoelectric material is cut into a size to form each piezoelectric substrate, and at least a part corresponding to the reflecting end face being formed through etching.

4. The surface acoustic wave device according to claim 1 , wherein a distance B from the base end of the conductor strips at the end of the reflector to the reflecting end face is determined according to the relationship:

B =( n×PR )±( PR/ 2)×δ

where λ is a wavelength of a Rayleigh wave, n is an integer, PR=λ/2, a width of the groove is n×PR, and δ is an allowance value in a range of ±1 associated with a position of the reflecting end face and the number of the conductor strips of the reflector when the number of pairs of electrode digits of the IDT is fixed.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 5, 2002
From: MAEDA, YOSHIO; KOMATSU, SHOUICHI; KINOSHITA, YUSUKE
To: SEIKO EPSON CORPORATION
Reel/Frame 013416/0154 →
Priority Claims (1)
JP 2001-3025 · Jan 10, 2001 · national
Continuity (1)
Related Publication 20030020367A1 · Jan 30, 2003