Glass material for a substrate, glass substrate, and information recording medium employing the same
A glass material for a substrate, or a glass substrate, consists essentially of the following glass ingredients: from 45 to 70 wt % of SiO 2 , from 1 to 10 wt % of Al 2 O 3 , from 0.5 to 8 wt % of B 2 O 3 , from 7 to 20 wt % of Li 2 O+Na 2 O+K 2 O, from 0.1 to 10 wt % of MgO, from 0.1 to 10 wt % of CaO, from 1 to 15 wt % of MgO+CaO, from 0.5 to 10 wt % of TiO 2 , from 0.5 to 10 wt % of ZrO 2 , from 0 to 5 wt % of ZnO, and from 0 to 8 wt % of La 2 O 3 . The glass material, or the glass substrate, has uniform composition between at the surface and in the interior and has an amorphous structure. With this design, it is possible to obtain high mechanical strength without strengthening treatment, a linear thermal expansion coefficient close to motor components, and excellent chemical durability.
1. A glass material for a substrate, consisting essentially of the following glass ingredients:
from 53 to 60 wt % of SiO 2 ,
from 4 to 8 wt % of Al 2 O 3 ,
from 3 to 4 wt % of B 2 O 3 ,
from 7 to 20 wt % of Li 2 O+Na 2 O+K 2 O,
from 0.1 to 10 wt % of MgO,
from 0.1 to 10 wt % of CaO,
from 1 to 15 wt % of MgO+CaO,
from 3 to 7 wt % of TiO 2 ,
from 4 to 8 wt % of ZrO 2 ,
from 0 to 5 wt % of ZnO, and
from 0 to 8 wt % of La 2 O 3 .
2. A glass material as claimed in claim 1 , wherein the glass material has a linear thermal expansion coefficient A of 60×10 −7 /° C. or higher.
3. A glass material as claimed in claim 1 , wherein the glass material has alkali elution B of 250 ppb or lower per 2.5-inch disk.
4. A glass material as claimed in claim 1 , wherein the glass material has a Young's modulus E of 85 GPa or higher.
5. A glass material as claimed in claim 1 , wherein the glass material fulfills the following condition:
( A/B )× E× 10 7 ≧30
where
A represents a linear thermal expansion coefficient (/° C.);
B represents alkali elution (ppb) (per 2.5-inch disk); and
E represents a Young modulus (GPa).
6. A glass material as claimed in claim 1 , wherein the glass material fulfills the following conditions:
A≧ 70×10 −7 ,
B≦ 150 ppb (per 2.5-inch disk), and
E≧ 90.
7. A glass substrate consisting essentially of the following glass ingredients:
from 45 to 70 wt % of SiO 2 ,
from 1 to 10 wt % of Al 2 O 3 ,
from 0.5 to 8 wt % of B 2 O 3 ,
from 7 to 20 wt % of Li 2 O+Na 2 O+K 2 O,
from 0.1 to 10 wt % of MgO,
from 0.1 to 10 wt % of CaO,
from 1 to 15 wt % of MgO+CaO,
from 0.5 to 10 wt % of TiO 2 ,
from 0.5 to 10 wt % of ZrO 2 ,
from 0 to 5 wt % of ZnO, and
from 0 to 8 wt % of La 2 O 3 ,
wherein the glass substrate has uniform composition between at a surface and in an interior and has an amorphous structure and
wherein the glass substrate is produced by undergoing a polishing step and then a cleaning step in which the glass substrate is cleaned with at least one of a cure water liquid, an acidic liquid, and an alkaline liquid, and a surface roughness Ra after the polishing step and a surface roughness Ra′ after the cleaning step fulfill both of the following conditions:
Ra′/Ra≦1.5, and
Ra≦1.0 nm.
8. A glass material as claimed in claim 7 , wherein the glass material has a Vickers hardness Hv higher than 550.
9. A glass material as claimed in claim 7 , wherein a liquid phase temperature TL at which the glass material is melted when produced is 1,300° C. or lower.
10. A glass material as claimed in claim 7 , wherein a temperature T logη=2 at which the glass material has a melt viscosity of logη=2 is 1,450° C. or lower.
11. A glass material as claimed in claim 7 , wherein the glass material has a glass transition point Tg of 600° C. or lower.
12. An information recording medium comprising:
a glass substrate; and
a magnetic film formed on top of the glass substrate directly or with one or more primer and/or protective layers sandwiched in between,
wherein the glass substrate consists essentially of the following glass ingredients:
from 45 to 70 wt % of SiO 2 ,
from 1 to 10 wt % of Al 2 O 3 ,
from 05 to 8 wt % of B 2 O 3 ,
from 7 to 20 wt % of Li 2 O+Na 2 O+K 2 O,
from 0.1 to 10 wt % of MgO,
from 0.1 to 10 wt % of CaO,
from 1 to 15 wt % of MgO+CaO,
from 0.5 to 10 wt % of TiO 2 ,
from 0.5 to 10 wt % of ZrO 2 ,
from 0 to 5 wt % of ZnO, and
from 0 to 8 wt % of La 2 O 3 ,
wherein the glass substrate is produced by undergoing a polishing step and then a cleaning step in which the glass substrate is cleaned with at least one of a pure water liquid, an acidic liquid, and an alkaline liquid, and a surface roughness Ra after the polishing step and a surface roughness Ra′ after the cleaning step fulfill both of the following conditions:
Ra′/Ra≦1.5, and
Ra≦1.0 nm.
13. A glass material for a substrate, consisting essentially of the following glass ingredients:
from 53 to 70 wt % of SiO 2 ,
from 1 to 10 wt % of Al 2 O 3 ,
from 2 to 5 wt % of B 2 O 3 ,
from 7 to 20 wt % of Li 2 O+Na 2 O,
from 0.1 to 10 wt % of MgO,
from 0.1 to 10 wt % of CaO,
from 1 to 15 wt % of MgO+CaO,
from 0.5 to 10 wt % of TiO 2 ,
from 0.5 to 10wt % of ZrO 2 ,
from 0 to 5 wt % of ZnO,
from 0 to 8 wt % of La 2 O 3 ,
from 60 to 75 wt % of SiO 2 +Al 2 O 3 +B 2 O 3 , and
from 7 to 14 wt % of TiO 2 +ZrO 2 .
14. A glass material as claimed in claim 13 , the glass material fulfills the following condition:
( A/B )× E× 10 7 ≧30
where
A represents a linear thermal expansion coefficient (/° C.),
B represents alkali elution (ppb) (per 2.5-inch disk), and
E represents a Young's modulus (GPa).