IP Library › Granted Patent US 6,958,927

Granted Patent B1

US 6,958,927 · App. 10/269,011 · Granted Oct 25, 2005

Magnetic element utilizing spin-transfer and half-metals and an MRAM device using the magnetic element

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Quick Facts

Patent No.: US 6,958,927
App. No.: 10/269,011
Granted: Oct 25, 2005
Kind: B1

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USPTO Patent Center↗ Full Patent PDF↗

Abstract

A magnetic element that can be used in a memory array having high density includes a pinned layer, a half-metallic material layer, a spacer (or a barrier) layer and a free layer. The half-metallic material layer is formed on the pinned layer and preferably has a thickness that is less than about 100 Å. The half-metallic material layer can be formed to be a continuous layer or a discontinuous on the pinned layer. The spacer (or barrier) layer is formed on the half-metallic material layer, such that the spacer (or barrier) layer is nonmagnetic and conductive (or insulating). The free layer is formed on the spacer (or barrier) layer and has a second magnetization that changes direction based on the spin-transfer effect when a write current passes through the magnetic element.

Claims (243)

1. A magnetic element, comprising:

a pinned layer and having a first magnetization that is pinned in a first direction;

a half-metallic material layer formed on the pinned layer;

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive; and

a free layer formed on the spacer layer, the free layer having a second magnetization that changes direction based on the spin-transfer effect when a write current passes through the magnetic element.

2. The magnetic element according to claim 1 , wherein the pinned layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

3. The magnetic element according to claim 1 , wherein the pinned layer is formed from a half-metallic material;

wherein the pinned layer and the half-metallic layer form a single layer; and

wherein and the free layer is configured such that the second magnetization changes direction based on the spin-transfer effect when a write current passes through the magnetic element.

4. The magnetic element according to claim 3 , wherein the half-metallic material layer forming the pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

5. The magnetic element according to claim 1 , wherein the half-metallic material layer is formed from one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

6. The magnetic element according to claim 1 , wherein the half-metallic material layer has a thickness that is less than about 100 Å.

7. The magnetic element according to claim 1 , wherein the half-metallic material layer is a continuous layer on the pinned layer.

8. A magnetic element, comprising:

a pinned layer and having a first magnetization that is pinned in a first direction;

a half-metallic material layer formed on the pinned layer;

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive; and

wherein the half-metallic material layer is a discontinuous layer on the pinned layer.

9. The magnetic element according to claim 1 , wherein the free layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

10. The magnetic element according to claim 1 , wherein the free layer is formed from a half-metallic material.

11. The magnetic element according to claim 10 , wherein the half-metallic material layer forming the free layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

12. A magnetic element, comprising:

a pinned layer and having a first magnetization that is pinned in a first direction;

a half-metallic material layer formed on the pinned layer;

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive; and

a second spacer layer formed on the free layer, the second spacer layer being nonmagnetic and conductive;

a second half-metallic material layer formed on the second spacer layer; and

a second pinned layer formed on the second half-metallic layer, the second pinned layer having a third magnetization that is pinned in a direction that is different from the first direction.

13. The magnetic element according to claim 12 , wherein the second pinned layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

14. The magnetic element according to claim 12 , wherein the second pinned layer is formed from a half-metallic material, and

wherein the second pinned layer and the second half-metallic layer form a single layer.

15. The magnetic element according to claim 14 , wherein the half-metallic material layer forming the second pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

16. The magnetic element according to claim 12 , wherein at least one half-metallic material layer is formed one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

17. The magnetic element according to claim 12 , wherein at least one half-metallic material layer has a thickness that is less than about 100 Å.

18. The magnetic element according to claim 12 , wherein at least one half-metallic material layer is formed as a continuous layer.

19. The magnetic element according to claim 12 , wherein at least one half-metallic material layer is formed as a discontinuous layer.

20. A magnetic element, comprising:

a pinned layer and having a first magnetization that is pinned in a first direction;

a half-metallic material layer formed on the pinned layer;

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive; and

a barrier layer formed on the free layer, the barrier layer an insulator and having a thickness that allows tunneling through the barrier layer;

a second half-metallic material layer formed on the barrier layer; and

a second pinned layer formed on the second half-metallic layer, the second pinned layer having a third magnetization that is pinned in a direction that is different from the first direction.

21. The magnetic element according to claim 20 , wherein the second pinned layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

22. The magnetic element according to claim 20 , wherein the second pinned layer is formed from a half-metallic material, and

wherein the second pinned layer and the second half-metallic layer form a single layer.

23. The magnetic element according to claim 22 , wherein the half-metallic material layer forming the second pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

24. The magnetic element according to claim 20 , wherein at least one half-metallic material layer is formed one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

25. The magnetic element according to claim 20 , wherein at least one half-metallic material layer has a thickness that is less than about 100 Å.

26. The magnetic element according to claim 20 , wherein at least one half-metallic material layer is formed as a continuous layer.

27. The magnetic element according to claim 20 , wherein at least one half-metallic material layer is formed as a discontinuous layer.

28. A magnetic memory device, comprising:

a plurality of magnetic cells including a plurality of magnetic elements, at least one magnetic element including,

a pinned layer and having a first magnetization that is pinned in a first direction,

a half-metallic material layer formed on the pinned layer,

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive, and

a plurality of rows lines coupled to the plurality of magnetic cells; and

a plurality of column lines coupled to the plurality of magnetic cells, the plurality of row lines and the plurality of column lines selecting a portion of the plurality of magnetic cells for reading and writing.

29. The magnetic memory device according to claim 28 , wherein at least one pinned layer of at least one magnetic element is formed from one of a ferromagnetic material and a ferrimagnetic material.

30. The magnetic memory device according to claim 28 , wherein at least one pinned layer of at least one magnetic element is formed from a half-metallic material;

wherein the pinned layer and the half-metallic layer form a single layer; and

wherein and the free layer is configured such that the second magnetization changes direction based on the spin-transfer effect when a write current passes through the magnetic element.

31. The magnetic memory device according to claim 30 , wherein at least one half-metallic material layer forming at least one pinned layer of at least one magnetic element is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

32. The magnetic memory device according to claim 28 , wherein at least one half-metallic material layer of at least one magnetic element is formed from one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

33. The magnetic memory device according to claim 28 , wherein at least one half-metallic material layer of at least one magnetic element has a thickness that is less than about 100 Å.

34. The magnetic memory device according to claim 28 , wherein at least one half-metallic material layer of at least one magnetic element is a continuous layer.

35. A magnetic memory device, comprising:

a plurality of magnetic cells including a plurality of magnetic elements, at least one magnetic element including,

a pinned layer and having a first magnetization that is pinned in a first direction,

a half-metallic material layer formed on the pinned layer,

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive, and

a plurality of rows lines coupled to the plurality of magnetic cells; and

wherein at least one half-metallic material layer of at least one magnetic element is a discontinuous layer.

36. The magnetic memory device according to claim 28 , wherein at least one free layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

37. The magnetic memory device according to claim 28 , wherein the free layer is formed from a half-metallic material.

38. The magnetic memory device according to claim 37 , wherein the half-metallic material layer forming the free layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

39. A magnetic memory device, comprising:

a plurality of magnetic cells including a plurality of magnetic elements, at least one magnetic element including,

a pinned layer and having a first magnetization that is pinned in a first direction,

a half-metallic material layer formed on the pinned layer,

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive, and

a plurality of rows lines coupled to the plurality of magnetic cells; and

wherein at least one magnetic element further includes:

a second spacer layer formed on the free layer, the second spacer layer being nonmagnetic and conductive;

a second half-metallic material layer formed on the second spacer layer; and

a second pinned layer formed on the second half-metallic layer, the second pinned layer having a third magnetization that is pinned in a direction that is different from the first direction.

40. The magnetic memory device according to claim 39 , wherein at least one second pinned layer of at least one magnetic element is formed from one of a ferrimagnetic material and a ferrimagnetic material.

41. The magnetic element according to claim 39 , wherein at least one second pinned layer of at least one magnetic element is formed from a half-metallic material, and

wherein the second pinned layer and the second half-metallic layer form a single layer.

42. The magnetic element according to claim 41 , wherein the half-metallic material layer forming the second pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

43. The magnetic memory device according to claim 39 , wherein at least one half-metallic material layer of at least one magnetic element is formed from one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

44. The magnetic memory device according to claim 39 , wherein at least one half-metallic material layer of at least one magnetic element has a thickness that is less than about 100 Å.

45. The magnetic memory device according to claim 39 , wherein at least one half-metallic material layer of at least one magnetic element is formed as a continuous layer.

46. The magnetic memory device according to claim 39 , wherein at least one half-metallic material layer of at least one magnetic element is formed as a discontinuous layer.

47. A magnetic memory device, comprising:

a plurality of magnetic cells including a plurality of magnetic elements, at least one magnetic element including,

a pinned layer and having a first magnetization that is pinned in a first direction,

a half-metallic material layer formed on the pinned layer,

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive, and

a plurality of rows lines coupled to the plurality of magnetic cells; and

a plurality of column lines coupled to the plurality of magnetic cells the plurality of row lines and the plurality of column lines selecting a portion of the plurality of magnetic cells for reading and writing;

wherein at least one magnetic element further includes:

a barrier layer formed on the free layer, the barrier layer an insulator and having a thickness that allows tunneling through the barrier layer;

a second half-metallic material layer formed on the barrier layer; and

a second pinned layer formed on the second half-metallic layer, the second pinned layer having a third magnetization that is pinned in a direction that is different from the first direction.

48. The magnetic memory device according to claim 47 , wherein at least one pinned layer of at least one magnetic element is formed from one of a ferromagnetic material and a ferrimagnetic material.

49. The magnetic memory device according to claim 47 , wherein the second pinned layer of at least one magnetic element is formed from a half-metallic material, and

wherein the second pinned layer and the second half-metallic layer of the magnetic element form a single layer.

50. The magnetic memory device according to claim 49 , wherein the half-metallic material layer forming the second pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

51. The magnetic memory device according to claim 47 , wherein at least one half-metallic material layer of at least one magnetic element is formed one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

52. The magnetic memory device according to claim 47 , wherein at least one half-metallic material layer of at least one magnetic element has a thickness that is less than about 100 Å.

53. The magnetic memory device according to claim 47 , wherein at least one half-metallic material layer of at least one magnetic element is formed as a continuous layer.

54. The magnetic memory device according to claim 47 , wherein at least one half-metallic material layer of at least one magnetic element is formed as a discontinuous layer.

55. A magnetic element, comprising:

a pinned layer and having a first magnetization that is pinned in a first direction;

a half-metallic material layer formed on the pinned layer;

a barrier layer formed on the half-metallic material layer, the barrier layer being an insulator and having a thickness that allows tunneling through the barrier layer; and

a free layer formed on the barrier layer, the free layer having a second magnetization that changes direction based on the spin-transfer effect when a write current passes through the magnetic element.

56. The magnetic element according to claim 55 , wherein the pinned layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

57. The magnetic element according to claim 55 , wherein the pinned layer is formed from a half-metallic material;

wherein the pinned layer and the half-metallic layer form a single layer; and

wherein and the free layer is configured such that the second magnetization changes direction based on the spin-transfer effect when a write current passes through the magnetic element.

58. The magnetic element according to claim 57 , wherein the half-metallic material layer forming the pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

59. The magnetic element according to claim 55 , wherein the half-metallic material layer is formed from one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

60. The magnetic element according to claim 55 , wherein the half-metallic material layer has a thickness that is less than about 100 Å.

61. The magnetic element according to claim 55 , wherein the half-metallic material layer is a continuous layer on the pinned layer.

62. A magnetic element, comprising:

a pinned layer and having a first magnetization that is pinned in a first direction;

a half-metallic material layer formed on the pinned layer;

a barrier layer formed on the half-metallic material layer, the barrier layer being an insulator and having a thickness that allows tunneling through the barrier layer; and

wherein the half-metallic material layer is a discontinuous layer on the pinned layer.

63. The magnetic element according to claim 55 , wherein the free layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

64. The magnetic element according to claim 55 , wherein the free layer is formed from a half-metallic material.

65. The magnetic element according to claim 64 , wherein the half-metallic material layer forming the free layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

66. A magnetic element, comprising:

a pinned layer and having a first magnetization that is pinned in a first direction;

a half-metallic material layer formed on the pinned layer;

a barrier layer formed on the half-metallic material layer, the barrier layer being an insulator and having a thickness that allows tunneling through the barrier layer;

a second barrier layer formed on the free layer, the second barrier layer an insulator and having a thickness that allows tunneling through the second barrier layer;

a second half-metallic material layer formed on the second barrier layer; and

a second pinned layer formed on the second half-metallic layer, the second pinned layer having a third magnetization that is pinned in a direction that is different from the first direction.

67. The magnetic element according to claim 66 , wherein the second pinned layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

68. The magnetic element according to claim 66 , wherein the second pinned layer is formed from a half-metallic material, and

wherein the second pinned layer and the second half-metallic layer form a single layer.

69. The magnetic element according to claim 68 , wherein the half-metallic material layer forming the second pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

70. The magnetic element according to claim 66 , wherein at least one half-metallic material layer is formed one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

71. The magnetic element according to claim 66 , wherein at least one half-metallic material layer has a thickness that is less than about 100 Å.

72. The magnetic element according to claim 66 , wherein at least one half-metallic material layer is formed as a continuous layer.

73. The magnetic element according to claim 66 , wherein at least one half-metallic material layer is formed as a discontinuous layer.

74. A magnetic element, comprising:

a pinned layer and having a first magnetization that is pinned in a first direction;

a half-metallic material layer formed on the pinned layer;

a barrier layer formed on the half-metallic material layer, the barrier layer being an insulator and having a thickness that allows tunneling through the barrier layer;

a spacer layer formed on the free layer, the spacer layer being nonmagnetic and conductive;

a second half-metallic material layer formed on the spacer layer; and

a second pinned layer formed on the second half-metallic layer, the second pinned layer having a third magnetization that is pinned in a direction that is different from the first direction.

75. The magnetic element according to claim 74 , wherein the second pinned layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

76. The magnetic element according to claim 74 , wherein the second pinned layer is formed from a half-metallic material, and

wherein the second pinned layer and the second half-metallic layer form a single layer.

77. The magnetic element according to claim 76 , wherein the half-metallic material layer forming the second pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

78. The magnetic element according to claim 74 , wherein at least one half-metallic material layer is formed one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

79. The magnetic element according to claim 74 , wherein at least one half-metallic material layer has a thickness that is less than about 100 Å.

80. The magnetic element according to claim 74 , wherein at least one half-metallic material layer is formed as a continuous layer.

81. The magnetic element according to claim 74 , wherein at least one half-metallic material layer is formed as a discontinuous layer.

82. A magnetic memory device, comprising:

a plurality of magnetic cells including a plurality of magnetic elements, at least one magnetic element including,

a pinned layer and having a first magnetization that is pinned in a first direction,

a half-metallic material layer formed on the pinned layer,

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive, and

a plurality of rows lines coupled to the plurality of magnetic cells; and

83. The magnetic memory device according to claim 82 , wherein at least one pinned layer of at least one magnetic element is formed from one of a ferromagnetic material and a ferrimagnetic material.

84. The magnetic memory device according to claim 82 , wherein at least one pinned layer of at least one magnetic element is formed from a half-metallic material;

wherein the pinned layer and the half-metallic layer form a single layer; and

wherein and the free layer is configured such that the second magnetization changes direction based on the spin-transfer effect when a write current passes through the magnetic element.

85. The magnetic memory device according to claim 82 , wherein at least one half-metallic material layer forming at least one pinned layer of at least one magnetic element is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

86. The magnetic memory device according to claim 82 , wherein at least one half-metallic material layer of at least one magnetic element is formed from one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

87. The magnetic memory device according to claim 82 , wherein at least one half-metallic material layer of at least one magnetic element has a thickness that is less than about 100 Å.

88. The magnetic memory device according to claim 82 , wherein at least one half-metallic material layer of at least one magnetic element is a continuous layer.

89. A magnetic memory device, comprising:

a plurality of magnetic cells including a plurality of magnetic elements, at least one magnetic element including

a pinned layer and having a first magnetization that is pinned in a first direction,

a half-metallic material layer formed on the pinned layer,

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive, and

a plurality of rows lines coupled to the plurality of magnetic cells; and

wherein at least one half-metallic material layer of at least one magnetic element is a discontinuous layer.

90. The magnetic memory device according to claim 82 , wherein at least one free layer of at least one magnetic element is formed from one of a ferromagnetic material and a ferrimagnetic material.

91. The magnetic memory device according to claim 90 , wherein at least one free layer of at least one magnetic element is formed from a half-metallic material.

92. The magnetic memory device according to claim 82 , wherein at least one half-metallic material layer of at least one magnetic element is formed from one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

93. A magnetic memory device, comprising:

a plurality of magnetic cells including a plurality of magnetic elements, at least one magnetic element including,

a pinned layer and having a first magnetization that is pinned in a first direction,

a half-metallic material layer formed on the pinned layer,

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive, and

a plurality of rows lines coupled to the plurality of magnetic cells;

wherein at least one magnetic element further includes:

a second barrier layer formed on the free layer, the barrier layer being an insulator and having a thickness that allows tunneling through the barrier layer;

a second half-metallic material layer formed on the second barrier layer; and

a second pinned layer formed on the second half-metallic layer, the second pinned layer having a third magnetization that is pinned in a direction that is different from the first direction.

94. The magnetic memory device according to claim 93 , wherein the second pinned layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

95. The magnetic memory device according to claim 93 , wherein the second pinned layer is formed from a half-metallic material, and

wherein the second pinned layer and the second half-metallic layer form a single layer.

96. The magnetic memory device according to claim 95 , wherein the half-metallic material layer forming the second pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

97. The magnetic memory device according to claim 93 , wherein at least one half-metallic material layer of at least one magnetic element is formed from one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

98. The magnetic memory device according to claim 93 , wherein at least one half-metallic material layer of at least one magnetic element has a thickness that is less than about 100 Å.

99. The magnetic memory device according to claim 93 , wherein at least one half-metallic material layer of at least one magnetic element is formed as a continuous layer.

100. The magnetic memory device according to claim 93 , wherein at least one half-metallic material layer of at least one magnetic element is formed as a discontinuous layer.

101. A magnetic memory device, comprising:

a plurality of magnetic cells including a plurality of magnetic elements, at least one magnetic element including,

a pinned layer and having a first magnetization that is pinned in a first direction,

a half-metallic material layer formed on the pinned layer,

a spacer layer formed on the half-metallic material layer, the spacer layer being nonmagnetic and conductive, and

a plurality of rows lines coupled to the plurality of magnetic cells; and

a spacer layer formed on the free layer, the spacer layer being nonmagnetic and conductive;

a second half-metallic material layer formed on the spacer layer; and

a second pinned layer formed on the second half-metallic layer, the second pinned layer having a third magnetization that is pinned in a direction that is different from the first direction.

102. The magnetic memory device according to claim 100 , wherein the second pinned layer is formed from one of a ferromagnetic material and a ferrimagnetic material.

103. The magnetic memory device according to claim 93 , wherein the second pinned layer is formed from a half-metallic material, and

wherein the second pinned layer and the second half-metallic layer form a single layer.

104. The magnetic memory device according to claim 103 , wherein the half-metallic material layer forming the second pinned layer is one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

105. The magnetic memory device according to claim 93 , wherein at least one half-metallic material layer of at least one magnetic element is formed from one of Fe 3 O 4 , CrO 2 , Sr 2 FeMoO 6 , (La0.7Sr0.3)MnO 3 , and NiMnSb.

106. The magnetic memory device according to claim 93 , wherein at least one half-metallic material layer of at least one magnetic element has a thickness that is less than about 100 Å.

107. The magnetic memory device according to claim 93 , wherein at least one half-metallic material layer of at least one magnetic element is formed as a continuous layer.

108. The magnetic memory device according to claim 93 , wherein at least one half-metallic material layer of at least one magnetic element is formed as a discontinuous layer.

Assignments (2)

ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 29, 2016

From: GRANDIS, INC.

To: SAMSUNG SEMICONDUCTOR INC.

Reel/Frame 037958/0728 →

ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 9, 2002

From: NGUYEN, PAUL P; HUAI, YIMING

To: GRANDIS INC.

Reel/Frame 013391/0068 →