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App. No. 10/283,807 · Confirmation No. 8843

Phase shift mask and fabrication method therefor

Inventor: Haruo Iwasaki
Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2004-12-27 ABN Abandonment 2 View
2004-06-15 CTNF Non-Final Rejection 6 View
2004-06-15 1449 List of References cited by applicant and considered by examiner 1 View
2004-06-15 892 List of references cited by examiner 1 View
2004-06-15 SRFW Search information including classification, databases and other search related notes 1 View
2003-02-03 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2003-02-03 FOR Foreign Reference 14 View
2003-02-03 FOR Foreign Reference 7 View
2003-02-03 FRPR Certified Copy of Foreign Priority Application 21 View
2003-01-23 A.PE Preliminary Amendment 1 View
2003-01-23 SPEC Specification 1 View
2003-01-23 CLM Claims 1 View
2003-01-23 REM Applicant Arguments/Remarks Made in an Amendment 3 View
2002-10-30 TRNA Transmittal of New Application 2 View
2002-10-30 SPEC Specification 12 View
2002-10-30 CLM Claims 4 View
2002-10-30 ABST Abstract 1 View
2002-10-30 DRW Drawings-only black and white line drawings 9 View
2002-10-30 OATH Oath or Declaration filed 2 View
2002-10-30 WFEE Fee Worksheet (SB06) 1 View
2002-10-30 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
10/283,807
Filed
2002-10-30
Pub. No.
US20030091909A1
Art Unit
1756