IP Library Granted Patent US 7,067,840
Granted Patent B2
US 7,067,840 · App. 10/283,883 · Granted Jun 27, 2006

Method and device for reducing the contact resistance in organic field-effect transistors by embedding nanoparticles to produce field boosting

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Quick Facts
Patent No.
US 7,067,840
App. No.
10/283,883
Granted
Jun 27, 2006
Kind
B2
Abstract

A method for selectively doping an organic semiconductor 1 material in the region of a contact area . 1 formed between a contact and the organic semiconductor material disposed thereon includes introducing the dopant with the aid of nanoparticles, the nanoparticles being disposed in a manner adjoining the contact area and, as a result, only a very narrow region of the organic semiconductor material being doped. The field increase effected by the nanoparticles results in a further reduction of the contact resistance.

Claims (26)

1. A semiconductor device configuration, comprising:

at least one contact of a contact material;

a layer of an organic semiconductor material, said layer disposed at said at least one contact to form a contact area therebetween;

nanoparticles disposed at said contact area; and

said organic semiconductor material having a doping in a vicinity of said nanoparticles, said doping being introduced by said nanoparticles, and said doping being selected from the group consisting of a protonated form of said organic semiconductor material, a deprotonated form of said organic semiconductor material, an oxidized form of said organic semiconductor material, a reduced form of said organic semiconductor material, and a charge transfer complex constructed from said organic semiconductor material and said contact material.

2. The configuration according to claim 1 , wherein said nanoparticles are of a material having a different work function than said contact material.

3. The configuration according to claim 1 , wherein:

said contact forms at least one of a source electrode and a drain electrode of a field-effect transistor; and

said layer of said organic semiconductor material is disposed between said source electrode and said drain electrode.

4. The configuration according to claim 1 , wherein:

the configuration is a field-effect transistor;

said contact forms at least one of a source electrode and a drain electrode; and

said layer of said organic semiconductor material is disposed between said source electrode and said drain electrode.

5. In a semicondudtor device, a configuration comprising:

at least one contact of a contact material;

a layer of an organic semiconductor material, said layer disposed at said at least one contact to form a contact area therebetween;

nanoparticles disposed at the contact area; and

said organic semiconductor material having a doping in a vicinity of said nanoparticles, said doping being introduced by said nanoparticles, and said doping being selected from the group consisting of a protonated form of said organic semiconductor material, a deprotonated form of said organic semiconductor material, an oxidized form of said organic semiconductor material, a reduced form of said organic semiconductor material, and a charge transfer complex constructed from said organic semiconductor material and said contact material.

6. The configuration according to claim 5 , wherein said nanoparticles are of a material having a different work function than said contact material.

7. The configuration according to claim 5 , wherein:

said contact forms at least one of a source electrode and a drain electrode of a field-effect transistor; and

said layer of said organic semiconductor material is disposed between said source electrode and said drain electrode.

8. The configuration according to claim 5 , wherein:

the configuration is a field-effect transistor;

said contact forms at least one of a source electrode and a drain electrode; and

said layer of said organic, semiconductor material is disposed between said source electrode and said drain electrode.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023773/0457 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2006
From: KLAUK, HAGEN; SCHMID, GUENTER
To: INFINEON TECHNOLOGIES AG
Reel/Frame 017419/0277 →