Erosion reduction for EUV laser produced plasma target sources
View Patent ↗A laser-plasma EUV radiation source ( 10 ) that employs one or more approaches for preventing vaporization of material from a nozzle assembly ( 40 ) of the source ( 10 ) by electrical discharge from the plasma ( 30 ). The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube ( 46 ). The tube ( 46 ) extends beyond all of the conductive surfaces of the nozzle assembly ( 40 ) by a suitable distance so that the pressure around the closest conducting portion of the nozzle assembly ( 40 ) is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source ( 40 ) from the vacuum chamber wall. A third approach includes applying a bias potential ( 52 ) to the nozzle assembly ( 40 ) to raise the potential of the nozzle assembly ( 40 ) to the potential of the arc.
1. An extreme ultraviolet (EUV) radiation source for generating EUV radiation, said source comprising:
a source nozzle for emitting a target material stream to a target area, said nozzle including a non-conductive portion, wherein the non-conductive portion is a capillary tube from which the target material stream is emitted; and
a laser source emitting a laser beam, said laser beam impinging the target material at the target area to create a plasma that emits the EUV radiation, said non-conductive portion of the nozzle being designed to prevent electrical discharge generated by the plasma from damaging the nozzle.
2. The source according to claim 1 wherein the non-conductive portion is closer to the target area than any conductive portion of the nozzle.
3. The source according to claim 2 wherein the closest conductive portion of the nozzle to the target area is in a portion of a vacuum chamber at a low enough pressure that does not support electrical discharge.
4. The source according to claim 1 wherein the capillary tube is made of a material selected from the group consisting of glass and ceramic.
5. The source according to claim 1 wherein the capillary tube is mounted to the nozzle by a conductive mounting hardware.
6. An extreme ultraviolet (EUV) radiation source for generating EUV radiation, said source comprising:
a source nozzle, said nozzle including a source material chamber for holding a target material, said nozzle further including a non-conductive capillary tube mounted to the material chamber by a conductive mounting hardware, said capillary tube emitting a target material stream from the nozzle to a target area; and
a laser source, said laser source emitting a laser beam that impinges the target material stream at the target area to create a plasma that emits the EUV radiation, said capillary tube preventing electrical discharge generated by the plasma from damaging the nozzle.
7. The source according to claim 6 wherein the capillary tube is made of a material selected from the group consisting of glass and ceramic.
8. The source according to claim 6 wherein the mounting hardware is located in a portion of a source vacuum chamber that is at a low enough pressure that it does not support the electrical discharge from the plasma.
9. An extreme ultraviolet (EUV) radiation source for generating EUV radiation, said source comprising:
a source nozzle for emitting a target material stream to a target area, said nozzle including an electrically isolating structure that electrically isolates the nozzle from a chamber wall of the source, wherein the electrically isolating structure is a mounting structure that mounts the nozzle to the chamber wall; and
a laser source, said laser source emitting a laser beam that impinges the target material stream at the target area to create a plasma that emits the EUV radiation, said electrically isolating structure preventing electrical discharge generated by the plasma from damaging the nozzle.
10. An extreme ultraviolet (EUV) radiation source for generating EUV radiation, said source comprising:
a source nozzle for emitting a target material stream to a target area, said nozzle including a bias source applying a bias potential to a conductive portion of the nozzle; and
a laser source emitting a laser beam, said laser beam impinging the target material stream at the target area to create a plasma that emits the EUV radiation, said bias source preventing current flow through the source nozzle from an electrical discharge generated by the plasma.
11. The source according to claim 10 wherein the bias source is a DC bias source that provides a bias potential substantially equal to a bias potential of the electrical discharge.
12. The source according to claim 10 wherein the bias source is electrically coupled to mounting hardware of the source nozzle, said mounting hardware mounting a capillary tube to the nozzle.
13. A method for protecting a nozzle of an extreme ultraviolet (EUV) radiation source from electrical discharge created by a plasma generated by the source, comprising:
emitting a target material stream from the nozzle to a target area;
emitting a laser beam from a laser source to the target area, said laser beam vaporizing the target material stream to create the plasma; and
preventing the electrical discharge created by the plasma from damaging the nozzle, wherein preventing the electrical discharge created by the plasma from damaging the nozzle includes providing a mounting structure that mounts the nozzle to a chamber wall of the source that prevents a current flow from propagating through the nozzle.
14. The method according to claim 13 wherein preventing the electrical discharge created by the plasma from damaging the nozzle further includes making a portion of the nozzle closest to the target area out of a non-conductive material.
15. The method according to claim 14 wherein the non-conductive portion is a nozzle tip emitting the target material stream.
16. The method according to claim 15 wherein the nozzle tip is made of a material selected from the group consisting of glass and ceramic.
17. A method for protecting a nozzle of an extreme ultraviolet (EUV radiation) source from electrical discharge created by a plasma generated by the source, comprising:
emitting a target material stream from the nozzle to a target area;
emitting a laser beam from a laser source to the target area, said laser beam vaporizing the target material stream to create the plasma; and
preventing the electrical discharge created by the plasma from damaging the nozzle, wherein preventing the electrical discharged created by the plasma from damaging the nozzle includes applying a bias potential to a conductive portion of the nozzle for equalizing the electrical discharge.
18. The method according to claim 17 wherein preventing the electrical discharge created by the plasma from damaging the nozzle includes making a portion of the nozzle closest to the target area out of a non-conductive material.
19. The method according to claim 17 wherein the non-conductive portion is a nozzle tip emitting the target material stream.
20. The method according to claim 17 wherein the nozzle tip is made of a material selected from the group consisting of glass and ceramic.
21. A method for protecting a nozzle of an extreme ultraviolet (EUV) radiation source from electrical discharge created by a plasma generated by the source, comprising:
emitting a target material stream from the nozzle to a target area;
emitting a laser beam from a laser source to the target area, said laser beam vaporizing the target material stream to create the plasma; and
preventing the electrical discharge created by the plasma from damaging the nozzle, wherein preventing the electrical discharge created by the plasma from damaging the nozzle includes providing a non-conductive capillary tube from which the target material stream is emitted.
22. The method according to claim 21 wherein the capillary tube is made of a material selected from the group consisting of glass and ceramic.