IP Library › Assignment 018552/0505
Patent Assignment
Reel/Frame 018552/0505

Assignment of Assignor's Interest

Recorded: 2006-11-20 Received: 2006-11-20 Pages: 5
Assignors
NORTHROP GRUMAN CORPORATION
Executed: 2004-07-14
Assignee
UNIVERSITY OF CENTRAL FLORIDA FOUNDATION, INC.
12433 RESEARCH PARKWAY, SUITE 301, ORLANDO, FL, 32826-3252, UNITED STATES
Covered Properties (14)
Monolithic Silicon Euv Collector
Application: 10/705,410 →
Laser-Produced Plasma Euv Light Source with Pre-Pulse Enhancement
Application: 10/606,854 →
Laser-Produced Plasma Euv Light Source with Isolated Plasma
Application: 10/606,447 →
Active Topical Skin Protectants Containing Amines, Polyalkenimines and /or Derivatives
Application: 10/429,431 →
Droplet and Filament Target Stabilizer for Euv Source Nozzles
Application: 10/317,402 →
Erosion Reduction for Euv Laser Produced Plasma Target Sources
Application: 10/289,086 →
Water Filtering Apparatus
Application: 10/270,082 →
Low Vapor Pressure, Low Debris Solid Target for Euv Production
Application: 10/269,760 →
Linear Filament Array Sheet for Euv Production
Application: 10/159,765 →
Gasdynamically-Controlled Droplets as the Target in a Laser-Plasma Extreme Ultraviolet Light Source
Application: 10/156,879 →
Target Steering System for Euv Droplet Generators
Application: 10/157,222 →
Droplet Target Delivery Method for High Pulse-Rate Laser-Plasma Extreme Ultraviolet Light Source
Application: 10/157,540 →
High Temperature Euv Source Nozzle
Application: 09/848,677 →
High Output Extreme Ultraviolet Source
Application: 09/848,692 →