System and method to reduce noise in a substrate
View Patent ↗A system and method for reducing noise in a substrate of a chip is provided. The system may include a substrate ( 70 ) doped with a first dopant. A first well ( 80 ) may be disposed on the substrate and doped with a second dopant. A second well ( 120 ) may be disposed within the first well ( 80 ) and doped with the second kind of dopant. A first transistor ( 100 ) may include one or more first transistor components disposed in the second well ( 120 ). The first transistor ( 100 ) may be adapted to employ a first type of channel having a quiet voltage source ( 140 ) connected to a body thereof. A third well ( 110 ) may be disposed within the first well ( 80 ) and doped with the first kind of dopant. A second transistor ( 90 ) may include one or more second transistor components that may be disposed in the third well ( 110 ). The second transistor ( 90 ) may be adapted to employ a second type of channel. The first well ( 80 ) may shield the substrate ( 70 ) from noise in the second well ( 120 ) and third well ( 110 ).
1. A system for reducing noise in the substrate of a chip, the system comprising:
a substrate doped with a first dopant;
a first well disposed on top of the substrate and doped with a second dopant;
a second well disposed within the first well, the second well doped with the second dopant;
a first transistor comprising at least one first transistor component disposed in the second well, the first transistor adapted to employ a first type of channel having a quiet voltage source connected to a body thereof;
a third well disposed within the first well, the third well doped with the first dopant; and
a second transistor comprising at least one second transistor component disposed in the third well, the second transistor adapted to employ a second type of channel, the first well isolating noise between the second well and the substrate.
2. The system according to claim 1 , wherein the first transistor and the second transistor are coupled in a complementary metal oxide semiconductor (CMOS) transistor arrangement.
3. The system according to claim 1 , wherein the first transistor is a p-channel MOS (PMOS) transistor and the second transistor is an n-channel MOS (NMOS) transistor.
4. The system according to claim 3 , wherein the PMOS transistor comprises a source coupled to a noisy voltage.
5. The system according to claim 4 , wherein the noisy voltage source and the quiet voltage source provide approximately a same voltage level.
6. The system according to claim 4 ,
wherein the body of the PMOS transistor is resistively coupled to the second well, and
wherein the noise in the second well emanates primarily from the body of the PMOS transistor.
7. The system according to claim 3 , wherein the NMOS transistor comprises a body and a source both coupled to a noisy voltage source.
8. The system according to claim 7 , wherein the body of the NMOS transistor is capacitively coupled to the substrate.
9. The system according to claim 3 , wherein the first well comprises a deep well.
10. The system according to claim 3 , wherein the first well is adapted to shield the substrate from noise emanating from a voltage source coupled to at least one of the first transistor and the second transistor.
11. The system according to claim 10 , wherein the noise comprises digital noise.