IP Library Granted Patent US 6,933,254
Granted Patent B2
US 6,933,254 · App. 10/298,529 · Granted Aug 23, 2005

Plasma-resistant articles and production method thereof

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Quick Facts
Patent No.
US 6,933,254
App. No.
10/298,529
Granted
Aug 23, 2005
Kind
B2
Abstract

A plasma-resistant article is provided in which a surface region of the article to be exposed to plasma in a corrosive atmosphere is formed from a zirconia-based ceramic that contains yttria in an amount of 7 to 17 mol %. The plasma-resistant article exhibits a sufficient resistance against exposure to plasma and is cost-effective. Preferably, the surface region has a centerline average roughness (Ra) of 1.2 to 5.0 μm, which is readily achieved through the use of an etching solution containing hydrofluoric acid. The present invention also provides a production method for such a plasma-resistant article.

Claims (3)

1. A method for producing a plasma-resistant article, comprising the steps of:

providing a ceramic article comprising of a zirconia-based ceramic containing 7 to 17 mol % of yttria formed over at least a surface region of the plasma-resistant article to be exposed to plasma in a corrosive atmosphere; and

treating the ceramic article with an etching solution containing hydrofluoric acid to impart to the surface of the zirconia-based ceramic a centerline average roughness (Ra) of 1.2 to 5.0 μm.

Assignments (3)
MERGER Recorded Sep 13, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019817/0749 →
MERGER Recorded Aug 6, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019649/0859 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 11, 2003
From: MORITA, KEIJI; UENO, HIROKO; MURAYAMA, HARUO
To: TOSHIBA CERAMICS CO., LTD.
Reel/Frame 014160/0829 →