IP Library Granted Patent US 7,306,829
Granted Patent B2
US 7,306,829 · App. 10/300,873 · Granted Dec 11, 2007

RF plasma reactor having a distribution chamber with at least one grid

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Quick Facts
Patent No.
US 7,306,829
App. No.
10/300,873
Granted
Dec 11, 2007
Kind
B2
Abstract

A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.

Claims (27)

1. A method of manufacturing a plasma treated workpiece, comprising

providing a plasma reactor with a plasma discharge space;

providing a gas distribution chamber between a plate with a multitude of gas feed openings therethrough and abutting into said plasma discharge space, and a wall distant from and opposite said plate, said wall having a multitude of gas inlet openings distributed along said wall into said distribution chamber and communicating with at least one gas feed line;

providing at least one grid within said distribution chamber so as to be spaced from end faces of said wall and said plate and electrically isolated from said wall and said plate;

exposing a workpiece to be treated to said plasma discharge space;

generating in said plasma discharge space a plasma

feeding a gas first through said gas feed line, then said gas inlet openings and said distribution chamber with said grid member, and finally through said gas feed openings directly into said discharge space

providing said plate with a metallic surface; and

operating said wall and said plate at different electrical potentials.

2. A method of manufacturing a plasma treated workpiece, comprising

providing a plasma reactor with a plasma discharge space;

providing a gas distribution chamber between a plate with a multitude of gas feed openings therethrough and towards said plasma discharge space and a wall distant from and opposite said plate, said wall having a multitude of gas inlet openings distributed along said wall into said distribution chamber and communicating with at least one gas feed line to said reactor;

providing a grid member within said distribution chamber spaced from and arranged along said wall and said plate;

exposing a workpiece to be treated to said plasma discharge space;

generating a plasma in said plasma discharge space, and

feeding a gas through said gas feed line, said gas feed openings, said distribution chamber with said grid member, and said gas inlet openings toward said discharge space, further comprising providing said wall and said plate with a metallic surface respectively, operating said surfaces at different electrical potentials, providing said at least one grid member to be made of an electroconductive material, said grid member electrically isolated from said metallic surfaces, and operating said grid member in an electrically floating manner.

3. The method of claim 1 , wherein said at least one grid member operates in an electrically floating manner.

4. A method of manufacturing a plasma treated workpiece, comprising

providing a plasma reactor with a plasma discharge space;

providing a gas distribution chamber between a plate with a multitude of gas feed openings therethrough and abutting into said plasma discharge space, and a wall distant from and opposite said plate, said wall having a multitude of gas inlet openings distributed along said wall into said distribution chamber and communicating with at least one gas feed line;

providing a plurality of grid members within said distribution chamber so as to be spaced from each other as well as from end faces of said wall and said plate,

exposing a workpiece to be treated to said plasma discharge space;

generating in said plasma discharge space a plasma, and

feeding a gas first through said gas feed line, then said gas inlet openings and said distribution chamber with said grid member, and finally through said gas feed openings directly into said discharge space

wherein said grid members are electrically isolated from said wall and said plate.

5. The method of claim 4 , wherein said grid members operate in an electrically floating manner.

6. The method of claim 1 , further comprising arranging the multitude of gas inlet openings in a cascaded pattern with branched portions to divide a gas flow fed thereto into sub-flows.

Assignments (4)
LICENSE Recorded Aug 1, 2014
From: TEL SOLAR AG
To: OC OERLIKON BALZERS AG
Reel/Frame 033459/0821 →
CHANGE OF NAME Recorded Aug 16, 2013
From: OERLIKON SOLAR AG, TRUBBACH
To: TEL SOLAR AG
Reel/Frame 031029/0927 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 27, 2011
From: OC OERLIKON BALZERS AG
To: OERLIKON SOLAR AG, TRUEBBACH
Reel/Frame 027130/0653 →
CHANGE OF NAME Recorded Nov 14, 2007
From: UNAXIS BALZERS AKTIENGESELLSCHAFT
To: OC OERLIKON BALZERS AG
Reel/Frame 020110/0242 →