IP Library Granted Patent US 7,087,912
Granted Patent B2
US 7,087,912 · App. 10/308,016 · Granted Aug 8, 2006

Ion beam irradiation apparatus for suppressing charge up of substrate and method for the same

Assignee: Nissin Electric Co., Ltd.
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Quick Facts
Patent No.
US 7,087,912
App. No.
10/308,016
Granted
Aug 8, 2006
Kind
B2
Abstract

An ion beam irradiation apparatus is equipped with a plasma generator which generates a plasma and supplies it to a region in the vicinity of the upstream side of a substrate, thereby suppressing a charging up of a surface of the substrate, which results from an irradiation of the ion beam. The radio frequency electric source for supplying the plasma for generating the plasma to a plasma generator is a radio frequency electric source for producing a radio frequency electric power formed by amplitude modulating an original radio frequency signal.

Claims (8)

1. An apparatus for irradiating a substrate with an ion beam, comprising:

a plasma generator generating a plasma by radio frequency discharge, the plasma generator supplying the plasma to a region in a vicinity of an upstream side of the substrate to thereby suppress a charge up of a surface of the substrate by the ion beam irradiation; and

a radio frequency electric source supplying a radio frequency electric power to the plasma generator in order to generate the plasma and a radio frequency electric source control device for selection between a continuous wave mode and a modulation wave mode

wherein the radio frequency electric source outputs the radio frequency electric power including a signal, which is formed by amplitude modulating an original radio frequency signal of the radio frequency electric source, so that an electron energy in the plasma is reduced to thereby reduce a charge up voltage of the substrate.

2. An apparatus for irradiating a substrate with an ion beam, comprising:

a plasma generator generating a plasma by radio frequency discharge, the plasma generator supplying the plasma to a region in a vicinity of an upstream side of the substrate to thereby suppress a charge up of a surface of the substrate by the ion beam irradiation; and

a radio frequency electric source supplying a radio frequency electric power to the plasma generator in order to generate the plasma,

wherein the radio frequency electric source is operable selectively in either of two operation modes, a continuous wave mode in which the radio frequency electric source generates a radio frequency electric power having a fixed amplitude, and a modulation wave mode in which said radio frequency electric source generates a radio frequency electric power formed by amplitude modulating an original radio frequency signal, and wherein a control device sets said radio frequency electric source in said continuous wave mode when said plasma generator generates a plasma, and wherein the control device sets the radio frequency electric source in said modulation wave mode after the plasma generator generates the plasma.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 16, 2006
From: NISSIN ELECTRIC CO., LTD.
To: NISSIN ION EQUIPMENT CO., LTD.
Reel/Frame 017345/0389 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 15, 2003
From: HAMAMOTO, NARIAKI
To: NISSIN ELECTRIC CO., LTD.
Reel/Frame 014068/0868 →
Priority Claims (1)
JP P.2001-370167 · Dec 4, 2001 · national
Continuity (1)
Related Publication 20030209430A1 · Nov 13, 2003