IP Library Granted Patent US 7,393,586
Granted Patent B2
US 7,393,586 · App. 10/311,884 · Granted Jul 1, 2008

Highly oxidation-resistant copper powder for conductive paste and process for producing the powder

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Quick Facts
Patent No.
US 7,393,586
App. No.
10/311,884
Granted
Jul 1, 2008
Kind
B2
Abstract

A highly oxidation-resistant copper powder for conductive paste, which is a copper powder containing not more than 5 wt % of Si, is characterized in that substantially all of the Si is adhered to the surfaces of the copper particles as SiO 2 -system gel coating film.

Claims (4)

1. A method for producing oxidation-resistant copper powder comprising:

reacting copper powder, an organosilane compound and water in a water-soluble organic solvent to generate a hydrolysate product of organosilane;

adding a gelling agent to a suspension obtained to form an SiO 2 -system gel coating film on surfaces of the copper powder particles; and

harvesting copper particles having the SiO 2 -system gel coating film by solid-liquid separation; wherein the reacting step includes the incorporation of another metallic alkoxide in addition to the organosilane compound.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 7, 2008
From: DOWA HOLDINGS CO., LTD.
To: DOWA ELECTRONICS MATERIALS CO., LTD.
Reel/Frame 020323/0715 →
CHANGE OF NAME Recorded Nov 5, 2007
From: DOWA MINING CO., LTD.
To: DOWA HOLDINGS CO., LTD.
Reel/Frame 020121/0161 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2003
From: OKADA, YOSHIHIRO; EBARA, ATSUSHI
To: DOWA MINING CO., LTD.
Reel/Frame 014248/0095 →