IP Library › Granted Patent US 6,699,626
Granted Patent Utility
US 6,699,626 · Confirmation No. 2789

MASK SET FOR USE IN PHASE SHIFT PHOTOLITHOGRAPHY TECHNIQUE WHICH IS SUITABLE TO FORM RANDOM PATTERNS

Inventor: Masashi Fujimoto
Patented Case View Patent ↗ View Publication ↗
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 Code Description Pages PDF
2004-01-06 IFEE Issue Fee Payment (PTO-85B) 1 View
2003-10-17 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2002-12-10 TRNA Transmittal of New Application 2 View
2002-12-10 ADS Application Data Sheet 3 View
2002-12-10 A.PE Preliminary Amendment 2 View
2002-12-10 SPEC Specification 31 View
2002-12-10 CLM Claims 5 View
2002-12-10 ABST Abstract 1 View
2002-12-10 DRW Drawings-only black and white line drawings 16 View
2002-12-10 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,699,626
App. No.
10/315,096
Filed
2002-12-10
Granted
2004-03-02
Pub. No.
US20030118919A1
Art Unit
1756
PTA
-120 days