IP Library Granted Patent US 7,227,257
Granted Patent B2
US 7,227,257 · App. 10/315,565 · Granted Jun 5, 2007

Cooling micro-channels

Assignee: Intel Corporation
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Quick Facts
Patent No.
US 7,227,257
App. No.
10/315,565
Granted
Jun 5, 2007
Kind
B2
Abstract

The present disclosure relates generally to microelectronic technology, and more specifically, to an apparatus used for the cooling of active electronic devices utilizing micro-channels or micro-trenches, and a technique for fabricating the same.

Claims (7)

1. An apparatus comprising:

a first semiconductor structure including internal integrated cooling channels;

a first bonding layer;

a second bonding layer bonded to said first bonding layer; and

a second semiconductor structure bonded to the first second semiconductor structure and including a layer of semiconductor material having a cleave plane formed therein wherein said second semiconductor structure includes a sacrificial layer.

2. The apparatus of claim 1 wherein at least one of said bonding layers includes silicon dioxide.

3. The apparatus of claim 1 wherein said second semiconductor structure is an active layer including integrated circuit devices.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 26, 2003
From: KIM, SARAH E.; LIST, R. SCOTT; MYERS, ALAN
To: INTEL CORPORATION
Reel/Frame 013901/0363 →
Continuity (1)
Related Publication 20040145047A1 · Jul 29, 2004