Reference image generation from subject image for photolithography mask analysis
View Patent ↗A reference image is generated from a subject image of at least a portion of a photolithography mask to enable a photolithography mask inspection and analysis system that otherwise cannot generate a reference image from a reference die or digitized design data, for example, to perform a mask analysis using the reference image. A mask inspection and analysis system may then be enhanced to perform one or more additional mask analyses to analyze the mask. The reference image is generated by identifying a defect or contaminant of the mask in the subject image and modifying the subject image to remove the defect or contaminant from the mask to generate the reference image. For one embodiment, a system using a STARlight inspection tool that captures transmitted and reflected images of a portion of a mask may then be enhanced to perform one or more mask analyses that use a reference image.
1. A method for use in a lithographic process, the method comprising:
identifying an area of a defect or contaminant of a mask in a subject image of at least a portion of the mask; and
replacing image data in the area of the defect or contaminant with image data not having the defect or contaminant to generate the reference image.
2. The method of claim 1 , wherein the subject image comprises a transmitted image of at least a portion of the mask and wherein the identifying comprises comparing at least a portion of the transmitted image to at least a portion of a reflected image of at least a portion of the mask.
3. The method of claim 1 , wherein the replacing comprises generating image data not having the defect or contaminant based on image data near the area of the defect or contaminant in the subject image.
4. The method of claim 3 , wherein the generating comprises extending an edge of the mask into the area of the defect or contaminant.
5. The method of claim 1 , comprising capturing the subject image.
6. The method of claim 1 , comprising analyzing the defect or contaminant of the mask using the subject image and the reference image.
7. A computer-readable medium having instructions which, when executed by a computer system, cause the computer system to perform a method in a lithographic process, the method comprising:
identifying an area of a defect or contaminant of a mask in a subject image of at least a portion of the mask; and
replacing image data in the area of the defect or contaminant with image data not having the defect or contaminant to generate the reference image.
8. The computer-readable medium of claim 7 , wherein the subject image comprises a transmitted image of at least a portion of the mask and wherein the identifying comprises comparing at least a portion of the transmitted image to at least a portion of a reflected image of at least a portion of the mask.
9. The computer-readable medium of claim 7 , wherein the replacing comprises generating image data not having the defect or contaminant based on image data near the area of the defect or contaminant in the subject image.
10. The computer-readable medium of claim 9 , wherein the generating comprises extending an edge of the mask into the area of the defect or contaminant.
11. The computer-readable medium of claim 7 , wherein the method comprises analyzing the defect or contaminant of the mask using the subject image and the reference image.
12. An apparatus for use in a lithographic process, the apparatus comprising:
means for identifying an area of a defect or contaminant of a mask in a subject image of at least a portion of the mask; and
means for replacing image data in the area of the defect or contaminant with image data not having the defect or contaminant to generate the reference image.
13. The apparatus of claim 12 , wherein the subject image comprises a transmitted image of at least a portion of the mask and wherein the identifying means comprises means for comparing at least a portion of the transmitted image to at least a portion of a reflected image of at least a portion of the mask.
14. The apparatus of claim 12 , comprising means for capturing the subject image.
15. The apparatus of claim 12 , comprising means for analyzing the defect or contaminant of the mask using the subject image and the reference image.