Patent Assignment
Reel/Frame 023774/0882
Confirmation of Assignment
Recorded: 2010-01-13
Pages: 13
Assignor
NUMERICAL TECHNOLOGIES, INC.
Executed: 2009-12-16
Assignee
SYNOPSYS MERGER HOLDINGS LLC
700 EAST MIDDLEFIELD ROAD, MOUNTAIN VIEW, CALIFORNIA, 94043
Covered Properties
(41)
Visual Inspection and Verification System
Structure and Method of Correcting Proximity Effects in a Tri-Tone Attenuated Phase-Shifting Mask
Self-Aligned Fabrication Technique for Tri-Tone Attenuated Phase-Shifting Masks
System and Method of Providing Mask Defect Printability Analysis
Blank for Alternating Psm Photomask with Charge Dissipation Layer
Alternating Phase Shift Mask Design Conflict Resolution
Method and Apparatus for Allowing Phase Conflicts in Phase Shifting Mask and Chromeless Phase Edges
System and Method for Indentifying Dummy Features on a Mask Layer
Microloading Effect Correction
System and Method for Correcting 3D Effects in an Alternating Phase-Shifting Mask
Simulation Using Design Geometry Information
Method of Incorporating Lens Aberration Information into Various Process Flows
Method for Providing Flexible and Dynamic Reporting Capability Using Simulation Tools
Simulation-Based Feed Forward Process Control
Shape-Based Geometry Engine to Perform Smoothing and Other Layout Beautification Operations
Automated Flow in Psm Phase Assignment
System and Method to Determine Impact of Line End Shortening
Method and System for Simulating Resist and Etch Edges
Design Data Format and Hierarchy Management for Phase Processing
Standard Cell Design Incorporating Phase Information
Model-Based Data Conversion
Repetition Recognition Using Segments
Soft Defect Printability Simulation and Analysis for Masks
Accelerated Layout Processing Using Opc Pre-Processing
Phase Shifting Mask Topography Effect Correction Based on Near-Field Image Properties
Alternating Phase Shift Mask Design Conflict Resolution
Mask Repair Using Multiple Exposures
Critical Dimension Control Using Full Phase and Trim Masks
Full Phase Shifting Mask in Damascene Process
Method for Facilitating Automatic Analysis of Defect Printability
Identifying Phantom Images Generated by Side-Lobes
Reference Image Generation from Subject Image for Photolithography Mask Analysis
Verification Utilizing Instance-Based Hierarchy Management
Incremental Lithography Mask Layout Design and Verification
Lithography Process Modeling of Asymmetric Patterns
Cutting Patterns for Full Phase Shifting Masks
Simulation Based Psm Clear Defect Repair Method and System
Mask Cost Driven Logic Optimization and Synthesis
Structure and Method of Correcting Proximity Effects in a Tri-Tone Attenuated Phase-Shifting Mask
System and Method for Correcting 3D Effects in an Alternating Phase-Shifting Mask
Model-Based Data Conversion
Related Assignments
(1)
Other recorded transfers of the patents in this record — the chain of ownership.