IP Library Granted Patent US 6,953,956
Granted Patent B2
US 6,953,956 · App. 10/321,669 · Granted Oct 11, 2005

Semiconductor device having borderless logic array and flexible I/O

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 6,953,956
App. No.
10/321,669
Granted
Oct 11, 2005
Kind
B2
Abstract

A novel method is presented to provide ASICs with drastically reduced NRE and with volume flexibility. The invention includes a method of fabricating an integrated circuit, including the steps of: providing a semiconductor substrate, forming a borderless logic array including a plurality of Area I/Os and also including the step of forming redistribution layer for redistribution at least some of the Area I/Os for the purpose of the device packaging. The fabrication may utilize Direct Write e-Beam for customization. The customization step may include fabricating various types of devices at different volume from the same wafer.

Claims (20)

1. A semiconductor device comprising:

a borderless logic array;

area I/Os; and

a redistribution layer for redistributing at least some of said area I/Os.

2. A semiconductor device according to claim 1 and wherein at least one pad used to connect said semiconductor device to other devices overlays at least a portion of the logic array or a portion of the area I/Os.

3. A semiconductor device according to claim 1 and also comprising:

a borderless memory array.

4. A semiconductor device according to claim 1 and wherein said logic array comprises:

a module array.

5. A semiconductor device according to claim 1 , further comprising interconnections within the logic array, wherein said logic array interconnections comprise metal layers and via layers, and wherein at least one of said metal layers comprises at least one substantially repeating pattern for a portion used for said interconnections.

6. A semiconductor device according to claim 5 and wherein at least two of said metal layers comprise substantially repeating patterns for portions used for said interconnections.

7. A semiconductor device according to claim 5 and wherein at least three of said metal layers comprise substantially repeating patterns for portions used for said interconnections.

8. A semiconductor device according to claim 1 and wherein said area I/Os are positioned in a non-surrounding fashion with respect to said logic array.

9. A semiconductor device according to claim 1 and wherein said logic array comprises a repeating module, and wherein said area I/Os are positioned in a non-surrounding fashion with respect to at least one of said repeating module.

10. A semiconductor device according to claim 1 , wherein said logic array comprises a repeating core, and wherein at least one of said area I/Os is a configurable I/O.

11. A semiconductor device according to claim 1 and wherein said borderless logic array is formed by a process that includes a step of positioning said area I/Os in a non-surrounding fashion with respect to said logic array.

12. A semiconductor device according to claim 1 and wherein said logic array comprises a repeating core, and wherein said borderless logic array is formed by a process that includes a step of positioning said area I/Os in a non-surrounding fashion with respect to said logic array.

13. A semiconductor device according to claim 1 , wherein said logic array comprises a repeating core, and wherein said borderless logic array is formed by a process that includes a step of positioning said area I/Os within said core, and wherein at least one of said area I/Os is configurable I/O.

14. A semiconductor device as in claim 1 , wherein at least one of said area I/Os comprises a configurable I/O.

15. A semiconductor device as in claim 14 , wherein said configurable I/O comprises multiple copies of input, output, and pre-output cells, and wherein the semiconductor device further comprises connections between at least one of said input, output, and pre-output cells and area I/O pads to construct an area I/O.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 11, 2019
From: EASIC CORPORATION
To: INTEL CORPORATION
Reel/Frame 048559/0162 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 18, 2002
From: OR-BACH, ZVI; COOKE, LAURANCE
To: EASIC CORPORATION
Reel/Frame 013594/0231 →