Spin-on adhesive for temporary wafer coating and mounting to support wafer thinning and backside processing
View Patent ↗A liquid form adhesive system is provided for spin-coating on wafers and mounting to rigid carrier substrates to support thinning and backside processing. The liquid adhesive comprises about 30-35% of a rosin, between 5-10% of a thermoplastic urethane, a nonionic surfactant present between 1-3%, and a trace of an ultraviolet fluorescing dye. The entire system is dissolved in 50-65%, by weight, of a dual solvent mixture composed of dimethylacetamide and propylene glycol monomethyl ether. When the mixture is made to a specific viscosity, filtered, applied by a spin-coating method to the wafer frontside surface, and cured, the result is a uniform and smooth surface of defined thickness. When the coated wafer is mounted to a rigid substrate, it may be mechanically thinned to thicknesses down to and beyond 25 um, depending upon the wafer composition, diameter, and process. Once thinned, the adhesive is safe for backside processing and is dissolved away at completion to provide a thinned wafer that is clean and ready for final dicing or chipping operations.
1. A liquid adhesive having a viscosity suitable for spin-on applications to semiconductor wafers comprising:
a. a dual polymer system, including i) from about 30 percent to about 50 percent by weight of a resin tackifier adhesive and ii) from about 5 percent to about 25 percent by weight of a thermoplastic polymer adhesive strengthening agent;
b. a dual solvent system for the polymers, comprising a relatively high boiling point and a relatively low boiling point solvent;
c. a nonionic surfactant; and
d. an ultraviolet (UV) dye detecting agent.
2. The composition of claim 1 wherein the resin tackifier (a (i)) is a gum rosin-modified maleic resin.
3. The composition of claim 1 wherein the thermoplastic polymer (a (ii)) is a polyurethane.
4. The composition of claim 1 wherein the solvent system (b) comprises dimethylacetamide and propylene glycol monomethyl ether.
5. The composition of claim 1 wherein the nonionic surfactant (c) is an alkoxylated linear alcohol having a high cloud point of >60° C.
6. The composition of claim 1 wherein the ultraviolet (UV) dye detecting agent (d) comprises a fluorescent substance of the variety diaminostilbenedisulfonic acid-cyanuric chloride (DASC).
7. The composition of claim 2 wherein the gum rosin-modified maleic resin has a melting point between about 150-200° C. and a total acid number (TAN) between about 150-250 mg KOH/g.
8. The composition of claim 3 wherein the polyurethane has a softening point between 50-80° C.
9. A method of manufacturing the composition of claim 1 that includes a filtration process wherein the filtration process is carried to a level such that a particle assay of the product does not exceed a mean size of 6 micron (um) and does not exceed a population of 50,000 counts per mililiter (Cts/ml).
10. The method of claim 9 wherein the particle assay is determined by using an electrolytic sensing zone.
11. The method of claim 10 wherein the particle assay is determined by use of a Multisizer 3 Particle Size Analyzer and Particle Counter.
12. A cured composition of claim 1 having a thermal stability consistent through 130° C.
13. The composition of claim 12 wherein the minimum weight loss determined as tested by thermal gravimetric analysis (TGA) is <5%.