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App. No. 10/341,159 · Confirmation No. 1417

Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2005-09-21 ABN Abandonment 2 View
2005-03-07 CTFR Final Rejection 6 View
2005-03-07 892 List of references cited by examiner 1 View
2005-03-07 FOR Foreign Reference 18 View
2005-03-07 FWCLM Index of Claims 1 View
2005-03-07 SRFW Search information including classification, databases and other search related notes 1 View
2004-12-27 WFEE Fee Worksheet (SB06) 1 View
2004-12-15 C.AD Change of Address 1 View
2004-11-22 A... Amendment/Request for Reconsideration-After Non-Final Rejection 1 View
2004-11-22 SPEC Specification 1 View
2004-11-22 CLM Claims 5 View
2004-11-22 REM Applicant Arguments/Remarks Made in an Amendment 2 View
2004-08-26 CTNF Non-Final Rejection 5 View
2004-08-26 1449 List of References cited by applicant and considered by examiner 1 View
2004-08-26 892 List of references cited by examiner 1 View
2004-08-26 FOR Foreign Reference 8 View
2004-08-26 FWCLM Index of Claims 1 View
2004-08-26 BIB Bibliographic Data Sheet 1 View
2004-08-26 SRFW Search information including classification, databases and other search related notes 1 View
2004-08-10 SRNT Examiner's search strategy and results 3 View
2004-07-19 LET. Miscellaneous Incoming Letter 1 View
2003-01-13 TRNA Transmittal of New Application 5 View
2003-01-13 A.PE Preliminary Amendment 6 View
2003-01-13 SPEC Specification 24 View
2003-01-13 CLM Claims 6 View
2003-01-13 ABST Abstract 1 View
2003-01-13 DRW Drawings-only black and white line drawings 7 View
2003-01-13 OATH Oath or Declaration filed 3 View
2003-01-13 WFEE Fee Worksheet (SB06) 1 View
2003-01-13 WFEE Fee Worksheet (SB06) 1 View
2003-01-13 WCLM Claims Worksheet (PTO-2022) 1 View
2003-01-13 IDS Information Disclosure Statement (IDS) Form (SB08) 4 View
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Quick Facts
App. No.
10/341,159
Filed
2003-01-13
Pub. No.
US20030104289A1
Art Unit
2826