Silicon nanoparticle and method for producing the same
View Patent ↗Highly uniform 1 nm silicon nanoparticles are provided by the invention. The nanoparticles exhibit beneficial properties. They are a source of stimulated emissions. They may be suspended in liquids, and solids. They can be formed into crystals, colloids and films. The nanoparticles of the invention are about 1 nm having about only one part in one thousand greater than 1 nm. A method for producing the silicon nanoparticle of the invention is a gradual advancing electrochemical etch of bulk silicon. Separation of nanoparticles from the surface of the silicon may also be conducted. Once separated, various methods may be employed to form plural nanoparticles into colloids, crystals, films and other desirable forms. The particles may also be coated or doped.
1. Elemental silicon formed into nanoparticles of about 1 nm having about only one part in one thousand greater than about 1 nm.
2. The elemental silicon of claim 1 , comprising nanoparticles of about 1 nm having about only one part in one thousand greater than about 1 nm formed into a film.
3. The elemental silicon of claim 1 , comprising nanoparticles of about 1 nm having about only one part in one thousand greater than about 1 nm forming crystals.
4. The elemental silicon of claim 1 , comprising nanoparticles of about 1 nm having about only one part in one thousand greater than about 1 nm formed into a colloid.
5. The elemental silicon of claim 1 , comprising oxide coated nanoparticles of about 1 nm having about only one part in one thousand greater than about 1 nm.
6. The elemental silicon of claim 1 , comprising doped nanoparticles of about 1 nm having about only one part in one thousand greater than about 1 nm.