Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
View Patent ↗The present invention provides a method to reduce adhesion between a polymerizable layer and a substrate surface that selectively comes into contact with the polymerizable layer. The method features disposing a coating upon the surface from a composition having a perfluoro silane containing molecule. The perfluoro silane molecule is connected to bonding regions on the surface forming covalent bonding groups, as well as contact regions. The contact regions include fluorinated chains of molecules. The covalent bonding groups are positioned between the surface and the contact regions. The perfluoro silane containing molecule may be applied to the surface as a monomolecular layer from a di-functional perfluoro silane molecule. Exemplary molecules that may be employed as the perfluoro silane containing molecule includes molecules sold under the trade-names FLUOROSYL™ FSD 2500 and FLUOROSYL™ FSD 4500.
1. A method to reduce adhesion between a polymerizable imprinting layer and an imprint device substrate surface in an imprint lithography process; the imprint device substrate surface having a plurality of bonding regions, said method comprising:
disposing a coating upon said imprint device substrate surface from a composition having a di-functional perfluoro silane containing molecule to provide for attachment to a pair of said bonding regions, with a fluorinated chain of molecules extending therebetween
wherein the coating provides for reduced adhesion between the polymerization imprinting layer and the imprint device substrate surface during an imprint lithography process.
2. The method as recited in claim 1 wherein disposing further includes forming said coating from a mono-molecular layer of said perfluoro silane containing molecule.
3. The method as recited in claim 1 wherein disposing further includes forming said perfluoro silane containing molecule from a perfluoroether di-functional trimethoxy silane molecule.
4. The method as recited in claim 1 wherein disposing further includes forming said perfluoro silane containing molecule from a molecule having a formula:
5. The method as recited in claim 1 wherein disposing further includes forming a liquid solution of said composition and placing said substrate into said solution.
6. The method as recited in claim 5 further including removing said substrate from said solution, with said substrate being present in said solution a sufficient time to leave a film of said composition upon said surface after removal from said solution and annealing said film to form said coating.
7. The method as recited in claim 1 further including forming said polymerizable layer from a mono-functional component; a poly-functional molecule component; and an initiator component combined with said mono-functional component.
8. The method as recited in claim 1 further including forming said substrate from quartz and providing said surface with a patterned area.
9. The method a recited in claim 1 further including attaching a mono-functional perfluoro silane containing molecule to a subset of said plurality of bonding regions.