Patent Assignment
Reel/Frame 033329/0280
Assignment of Joint Ownership
Recorded: 2014-07-15
Received: 2014-07-15
Pages: 25
Assignor
MOLECULAR IMPRINTS, INC.
Executed: 2014-07-10
Assignee
MII NEWCO, INC.
1807-C WEST BRAKER LN, AUSTIN, TX, 78708, UNITED STATES
Covered Properties
(100)
Nano Imprinting with Reusable Polymer Template with Metallic or Oxide Coating
Application:
14/216,017 →
Strain and Kinetics Control During Separation Phase of Imprint Process
Application:
14/150,261 →
Large Area Patterning of Nano-Sized Shapes
Application:
14/021,463 →
Nano-Imprint Lithography Templates
Application:
13/910,547 →
Large Area Imprint Lithography
Application:
13/773,217 →
Fabrication of High-Throughput Nano-Imprint Lithography Templates
Application:
13/754,015 →
Extrusion Reduction in Imprint Lithography
Application:
13/743,772 →
Fabrication of Seamless Large Area Master Templates for Imprint Lithography Using Step and Repeat Tools
Application:
13/720,315 →
Reduced Residual Formation in Etched Multi-Layer Stacks
Application:
13/546,622 →
Optically Absorptive Material for Alignment Marks
Application:
13/455,966 →
Photocatalytic Reactions in Nano-Imprint Lithography Processes
Application:
13/446,364 →
Critical Dimension Control During Template Formation
Application:
13/441,500 →
High Aspect Ratio Patterning of Silicon
Application:
13/398,442 →
Template Pillar Formation
Application:
13/352,824 →
Patterning of Non-Convex Shaped Nanostructures
Application:
13/290,770 →
Nanoimprint Lithography Formation of Functional Nanoparticles Using Dual Release Layers
Application:
13/289,601 →
High Contrast Alignment Marks Through Multiple Stage Imprinting
Application:
13/245,288 →
Vapor Delivery System For Use in Imprint Lithography
Application:
13/228,298 →
Release Agent Partition Control in Imprint Lithography
Application:
13/226,635 →
Methods of Cleaning Hard Drive Disk Substrates for Nanoimprint Lithography
Application:
13/227,205 →
Contaminate Detection and Substrate Cleaning
Application:
13/178,268 →
Enhanced Densification of Silicon Oxide Layers
Application:
13/178,057 →
Low-K Dielectric Functional Imprinting Materials
Application:
13/172,350 →
Step and Repeat Imprint Lithography Process
Application:
13/108,614 →
Reducing Adhesion between a Conformable Region and a Mold
Application:
13/106,407 →
Nanostructured Solar Cell
Application:
13/105,422 →
Backside Contact Solar Cell
Application:
13/105,695 →
Imprinting of Partial Fields at the Edge of the Wafer
Application:
13/098,959 →
Safe Separation for Nano Imprinting
Application:
13/095,514 →
Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
Application:
13/073,533 →
Capillary Imprinting Technique
Application:
13/028,336 →
Nanoimprint Lithography Processes for Forming Nanoparticles
Application:
13/017,259 →
Roll-To-Roll Imprint Lithography and Purging System
Application:
13/015,379 →
Methods and Systems of Material Removal and Pattern Transfer
Application:
13/014,508 →
Micro-Conformal Templates for Nanoimprint Lithography
Application:
13/014,354 →
Systems and Methods for Substrate Formation
Application:
12/987,196 →
Adhesion Layers in Nanoimprint Lithograhy
Application:
12/954,376 →
Positive Tone Bi-Layer Method
Application:
12/946,063 →
Method and System to Control Movement of a Body for Nano-Scale Manufacturing
Application:
12/942,652 →
Alignment System and Method for a Substrate in a Nano-Imprint Process
Application:
12/906,742 →
Imprint Lithography Method
Application:
12/905,192 →
Chucking System for Nano-Manufacturing
Application:
12/883,930 →
Functional Nanoparticles
Application:
12/854,359 →
Residual Layer Thickness Measurement and Correction
Application:
12/835,009 →
Imprint Alignment Method, System and Template
Application:
12/835,181 →
Chucking System with Recessed Support Feature
Application:
12/828,498 →
Dual Zone Template Chuck
Application:
12/817,787 →
Step and Repeat Imprint Lithography Processes
Application:
12/762,658 →
System and Method for Model Checking by Interleaving Stateless and State-Based Methods
Application:
12/753,239 →
Forming a Layer on a Substrate
Application:
12/749,552 →
Conforming Template for Patterning Liquids Disposed on Substrates
Application:
12/717,664 →
Capillary Imprinting Technique
Application:
12/707,365 →
Method for Expelling Gas Positioned Between a Substrate and a Mold
Application:
12/707,345 →
Positive Tone Bi-Layer Method
Application:
12/689,773 →
Method to Control an Atmosphere Between a Body and a Substrate
Application:
12/688,190 →
Method and System for Double-Sided Patterning of Substrates
Application:
12/686,732 →
Double-Sided Nano-Imprint Lithography System
Application:
12/684,538 →
Large Area Patterning of Nano-Sized Shapes
Application:
12/616,896 →
Chucking System Comprising an Array of Fluid Chambers
Application:
12/616,349 →
Substrate Alignment
Application:
12/610,714 →
Master Template Replication
Application:
12/607,564 →
Alignment for Edge Field Nano-Imprinting
Application:
12/606,274 →
Facilitating Adhesion Between Substrate and Patterned Layer
Application:
12/606,588 →
Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film
Application:
12/605,848 →
Strain and Kinetics Control During Separation Phase of Imprint Process
Application:
12/604,517 →
Imprint Lithography Template
Application:
12/604,866 →
Fluid Transport and Dispensing
Application:
12/603,819 →
Separation in an Imprint Lithography Process
Application:
12/603,270 →
Imprint Lithography System and Method
Application:
12/582,091 →
Fluid Dispense Device Calibration
Application:
12/582,041 →
Reduction of Stress During Template Separation
Application:
12/581,236 →
Nano-Imprint Lithography Stack with Enhanced Adhesion Between Silicon-Containing and Non-Silicon Containing Layers
Application:
12/581,634 →
Optical System for Use in Stage Control
Application:
12/580,324 →
Drop Pattern Generation with Edge Weighting
Application:
12/580,813 →
Imprint Lithography System and Method
Application:
12/575,907 →
Interferometric Analysis Method for the Manufacture of Nano-Scale Devices
Application:
12/576,030 →
Nano-Imprint Lithography Templates
Application:
12/572,838 →
Misalignment Management
Application:
12/553,645 →
Energy Sources for Curing in an Imprint Lithography System
Application:
12/511,593 →
Polarization Control Systems and Methods with Endless Polarization Tracking Using a Dithering Algorithm
Application:
12/499,678 →
Preserving Filled Features When Vacuum Wiping
Application:
12/488,642 →
Imprinting of Partial Fields at the Edge of the Wafer
Application:
12/479,437 →
Template Having Alignment Marks Formed of Contrast Material
Application:
12/464,487 →
Full-Wafer or Large Area Imprinting with Multiple Separated Sub-Fields for High Throughput Lithography
Application:
12/430,428 →
Large Area Roll-to-Roll Imprint Lithography
Application:
12/415,563 →
Composition to Reduce Adhesion Between a Conformable Region and a Mold
Application:
12/404,024 →
Real Time Imprint Process Diagnostics for Defects
Application:
12/392,663 →
Enhanced Multi Channel Alignment
Application:
12/389,673 →
Extrusion Reduction in Imprint Lithography
Application:
12/367,079 →
Controlling Template Surface Composition in Nano-Imprint Lithography
Application:
12/364,979 →
Template Pattern Density Doubling
Application:
12/344,100 →
An Imprint Lithography Method
Application:
12/336,821 →
High Throughput Imprint Based on Contact Line Motion Tracking Control
Application:
12/327,618 →
Ultra-Thin Polymeric Adhesion Layer
Application:
12/326,709 →
Porous Template and Imprinting Stack for Nano-Imprint Lithography
Application:
12/275,998 →
Drop Pattern Generation for Imprint Lithography
Application:
12/262,669 →
Self-Aligned Cross-Point Memory Fabrication
Application:
12/182,905 →
Alignment System and Method for a Substrate in a Nano-Imprint Process
Application:
12/175,258 →
Solvent-Assisted Layer Formation for Imprint Lithography
Application:
12/139,911 →
Methods for Exposure for the Purpose of Thermal Management for Imprint Lithography Processes
Application:
12/047,572 →