Template having a silicon nitride, silicon carbide or silicon oxynitride film
View Patent ↗An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
1. An imprint lithography template comprising:
an imprint lithography template body having a first thickness associated therewith; and,
an imprint lithography template patterning layer, having a second thickness associated therewith, the imprint lithography template patterning layer having a plurality of features, the features having a third thickness associated therewith, the patterning layer comprising a material selected from a set of materials consisting of silicon nitride, silicon oxynitride, and silicon carbide,
wherein the second thickness is defined by:
c 1 ×a<t<d/c 2
wherein d is said first thickness, t is said second thickness, a is said third thickness and c 1 is greater than 20 and c 2 is greater than 350.
2. The template of claim 1 , wherein the plurality of features includes a plurality of protrusions and recessions.
3. The template of claim 1 , further comprising an over-coat layer, with the imprint lithography template patterning layer being positioned between the imprint lithography template body and the over-coat layer, with the over-coat layer facilitating separation from a material in contact with the imprint lithography template.
4. The template of claim 1 , further comprising an over-coat layer, with the imprint lithography template patterning layer being positioned between the imprint lithography template body and the over-coat layer, with the over-coat layer facilitating wetting of a material in contact with the imprint lithography template.
5. The template of claim 1 , wherein the second thickness has a magnitude such that stress and thermal distortions thereof are minimized.
6. The template of claim 1 , wherein the second thickness has a magnitude of about 100 nm-5 μm.
7. The template of claim 1 , wherein the imprint lithography patterning layer is adapted to have a different index of refraction than material in contact with the imprint lithography template.
8. An imprint lithography template for patterning polymerizable material deposited on a substrate, comprising:
a body, and,
a patterning layer, the patterning layer comprising a material selected from a set of materials consisting of silicon nitride, silicon oxynitride, and silicon carbide, wherein the patterning layer is adapted to have a different index of refraction than the polymerizable material, wherein the body has a first thickness, the patterning layer has a second thickness, and the patterning features have a third thickness the first, second and third thicknesses being different; the second thickness is defined by:
c 1 ×a<t<d/c 2
wherein d is said first thickness, t is said second thickness, a is said third thickness and c 1 is greater than 20 and c 2 is greater than 350.
9. The template of claim 8 , further comprising an over-coat layer, with the patterning layer being positioned between the body and the over-coat layer, with the over-coat layer facilitating separation from a material in contact with the imprint lithography template.
10. The template of claim 8 , further comprising an over-coat layer, with the patterning layer being positioned between the body and the over-coat layer, with the over-coat layer facilitating wetting of a material in contact with the imprint lithography template.
11. The template of claim 8 , wherein the patterning layer includes patterning features.
12. The template of claim 8 , wherein the second thickness has a magnitude adapted to minimize stress and thermal distortions.
13. The template of claim 8 , wherein the second thickness has a magnitude of about 100 nm-5 μm.
14. An imprint lithography template, comprising:
a body;
a patterning layer having a plurality of features; the patterning comprising a material selected from a set of materials consisting of silicon nitride, silicon oxynitride, and silicon carbide, wherein the material has a different index of refraction than material in contact with the imprint lithography template wherein the body has a first thickness, the patterning layer has a second thickness, and the features have a third thickness the first, second and third thicknesses being different; the second thickness is defined by:
c 1 ×a<t<d/c 2
wherein d is said first thickness, t is said second thickness, a is said third thickness and c 1 , is greater than 20 and c 2 is greater than 350.
15. The imprint lithography template of claim 14 , further comprising an over-coat layer, with the patterning layer being positioned between the body and the over-coat layer, with the over-coat layer facilitating separation from a material in contact with the imprint lithography template.
16. The imprint lithography template of claim 14 , further comprising an over-coat layer, with the patterning layer being positioned between the body and the over-coat layer, with the over-coat layer facilitating wetting of the material in contact with the imprint lithography template.