Patent Assignment
Reel/Frame 026842/0929
Assignment of Assignor's Interest
Recorded: 2011-09-01
Pages: 17
Assignor
MOLECULAR IMPRINTS, INC.
Executed: 2011-09-01
Assignee
CANON INC.
30-2 SHIMOMARUKO 3-CHOME, OHTA-KU, TOKYO, 146-8501, JAPAN
Covered Properties
(110)
Methods of Manufacturing a Lithography Template
System and Method for Dispensing Liquids
Method for Imprint Lithography Using an Electric Field
Formation of Discontinuous Films During an Imprint Lithography Process
Step and Repeat Imprint Lithography Systems
Step and Repeat Imprint Lithography Processes
Alignment Methods for Imprint Lithography
Scatterometry Alignment for Imprint Lithography
Alignment Systems for Imprint Lithography
Method for Fabricating Bulbous-Shaped Vias
Functional Patterning Material for Imprint Lithography Processes
Method of Reducing Pattern Distortions During Imprint Lithography Processes
Chucking System for Modulating Shapes of Substrates
Methods of Inspecting a Lithography Template
Method for Modulating Shapes of Substrates
Method for Determining Characteristics of Substrate Employing Fluid Geometries
Method to Reduce Adhesion Between a Polymerizable Layer and a Substrate Employing a Fluorine-Containing Layer
Positive Tone Bi-Layer Imprint Lithography Method
Method of Forming Stepped Structures Employing Imprint Lithography
Assembly and Method for Transferring Imprint Lithography Templates
Method, System and Holder for Transferring Templates During Imprint Lithography Processes
Patent:
6,805,054 →
Application:
10/438,224 →
Method to Reduce Adhesion Between a Conformable Region and a Pattern of a Mold
Conforming Template for Patterning Liquids Disposed on Substrates
Systems for Magnification and Distortion Correction for Imprint Lithography Processes
Capillary Imprinting Technique
Imprint Lithography Template Having Opaque Alignment Marks
Single Phase Fluid Imprint Lithography Method
Applying Imprinting Material to Substrates Employing Electromagnetic Fields
Methods for Fabricating Patterned Features Utilizing Imprint Lithography
Magnification Correction Employing Out-of-Plane Distortion of a Substrate
Method and System to Measure Characteristics of a Film Disposed on a Substrate
Composition for an Etching Mask Comprising a Silicon-Containing Material
Compliant Hard Template for Uv Imprinting
System for Determining Characteristics of Substrates Employing Fluid Geometries
Chucking System for Modulating Shapes of Substrates
System for Dispensing Liquids
Imprint Alignment Method, System, and Template
Method of Creating a Turbulent Flow of Fluid Between a Mold and a Substrate
System for Creating a Turbulent Flow of Fluid Between a Mold and a Substrate
Method of Planarizing a Semiconductor Substrate with an Etching Chemistry
Moat System for an Imprint Lithography Template
Composition to Provide a Layer with Uniform Etch Characteristics
Method to Provide a Layer with Uniform Etch Characteristics
System for Determining Characteristics of Substrates Employing Fluid Geometries
Method of Patterning Surfaces While Providing Greater Control of Recess Anisotropy
Method of Forming an in-Situ Recessed Structure
Pattern Reversal Employing Thick Residual Layers
Method of Forming a Recessed Structure Employing a Reverse Tone Process
Patterning Substrates Employing Multi-Film Layers Defining Etch-Differential Interfaces
Reverse Tone Patterning on Surfaces Having Surface Planarity Perturbations
Method of Compensating for a Volumetric Shrinkage of a Material Disposed Upon a Substrate to Form a Substantially Planar Structure Therefrom
Interferometric Analysis Method for the Manufacture of Nano-Scale Devices
Interferometric Analysis for the Manufacture of Nano-Scale Devices
Chucking System for Nano-Manufacturing
Method of Retaining a Substrate to a Wafer Chuck
Composition to Reduce Adhesion Between a Conformable Region and a Mold
System for Controlling a Volume of Material on a Mold
Method for Fast Filling of Templates for Imprint Lithography Using on Template Dispense
Method of Separating a Mold from a Solidified Layer Disposed on a Substrate
Formation of Discontinuous Films During an Imprint Lithography Process
Step and Repeat Imprint Lithography Processes
System for Varying Dimensions of a Substrate During Nanoscale Manufacturing
Method of Varying Dimensions of a Substrate During Nano-Scale Manufacturing
Compliant Device for Nano-Scale Manufacturing
Apparatus to Vary Dimensions of a Substrate During Nano-Scale Manufacturing
Method of Controlling the Critical Dimension of Structures Formed on a Substrate
Composition for Adhering Materials Together
System to Transfer a Template Transfer Body Between a Motion Stage and a Docking Plate
Method to Control an Atmostphere Between a Body and a Substrate
System to Control an Atmosphere Between a Body and a Substrate
Etching Technique to Planarize a Multi-Layer Structure
Method of Providing Desirable Wetting and Release Characterstics Between a Mold and a Polymerizable Composition
Eliminating Printability of Sub-Resolution Defects in Imprint Lithography
Technique for Separating a Mold from Solidified Imprinting Material
Method of Forming a Compliant Template for Uv Imprinting
Bifurcated Contact Printing Technique
Imprint Lithography Substrate Processing Tool for Modulating Shapes of Substrates
Formation of Conductive Templates Employing Indium Tin Oxide
Composition for an Etching Mask Comprising a Silicon-Containing Material
Positive Tone Bi-Layer Imprint Lithography Method
Method and System for Double-Sided Patterning of Substrates
Method for Expelling Gas Positioned Between a Substrate and a Mold
Method of Forming a Recessed Structure Employing a Reverse Tone Process
Patterning Substrates Employing Multiple Chucks
Conforming Template for Patterning Liquids Disposed on Substrates
Chucking System Comprising an Array of Fluid Chambers
Self-Aligned Process for Fabricating Imprint Templates Containing Variously Etched Features
Imprinting of Partial Fields at the Edge of the Wafer
Partial Vacuum Environment Imprinting
Method for Obtaining Force Combinations for Template Deformation Using Nullspace and Methods Optimization Techniques
Method of Concurrently Patterning a Substrate Having a Plurality of Fields and a Plurality of Alignment Marks
Method for Detecting a Particle in a Nanoimprint Lithography System
Method for Expelling Gas Positioned Between a Substrate and a Mold
Imprint Lithography Template to Facilitate Control of Liquid Movement
Positive Tone Bi-Layer Method
Polymerization Technique to Attenuate Oxygen Inhibition of Solidification of Liquids and Composition Therefor
Method of Creating a Template Employing a Lift-Off Process
Capillary Imprinting Technique
Alignment System and Method for a Substrate in a Nano-Imprint Process
Self-Aligned Cross-Point Memory Fabrication
Enhanced Multi Channel Alignment
Real Time Imprint Process Diagnostics for Defects
Full-Wafer or Large Area Imprinting with Multiple Separated Sub-Fields for High Throughput Lithography
Interferometric Analysis Method for the Manufacture of Nano-Scale Devices
Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film
Method to Control an Atmosphere Between a Body and a Substrate
Positive Tone Bi-Layer Method
Capillary Imprinting Technique
Step and Repeat Imprint Lithography Processes
Positive Tone Bi-Layer Method
Related Assignments
(14)
Other recorded transfers of the patents in this record — the chain of ownership.
Correction of State of Incorporation of the Assignee Recited on the Assignment from Texas to Delaware
Nov 12, 2003
From: CHOI, BYUNG J.; MEISSL, MARIO J.; SREENIVASAN, SIDLGATA V.; WATTS, MICHAEL P.C.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 014680/0214 →
Correction of State of Incorporation of the Assignee Recited on the Assignment from Texas to Delaware Reel/Frame: 013576/0680
Nov 15, 2004
From: SREENIVASAN, SIDLGATA V.; BONNECAZE, ROGER T.; WILLSON, GRANT C.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 015982/0009 →
Security Interest
Jan 11, 2005
From: MOLECULAR IMPRINTS, INC.
To: VENTURE LENDING & LEASING IV, INC.
Reel/Frame 016133/0369 →
Release of Security Interest
Mar 27, 2007
From: VENTURE LENDING & LEASING IV, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 019072/0882 →
Release of Security Interest
Aug 29, 2011
From: VENTURE LENDING & LEASING III, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 026821/0159 →
Corrective Assignment to Correct the Nature of Conveyance from an "Assignment" to "Security Agreement" Previously Recorded on Reel 026842 Frame 0929. Assignor(S) Hereby Confirms the the Original Document Submitted Was a "Security Agreement".
Aug 13, 2013
From: MOLECULAR IMPRINTS, INC.
To: CANON INC.
Reel/Frame 031003/0031 →
Release of Security Interest
Jun 13, 2014
From: MOLECULAR IMPRINTS, INC.
To: CANON INC.
Reel/Frame 033161/0705 →
Corrective Assignment to Correct the Assignor and Assignee Previously Recorded on Reel 033161 Frame 0705. Assignor(S) Hereby Confirms the Assignment.
Jun 25, 2014
From: CANON INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 033227/0398 →
Assignment of Joint Ownership
Jul 15, 2014
From: MOLECULAR IMPRINTS, INC.
To: MII NEWCO, INC.
Reel/Frame 033329/0280 →
Change of Name
Jul 24, 2014
From: MOLECULAR IMPRINTS, INC.
To: CANON NANOTECHNOLOGIES, INC.
Reel/Frame 033400/0184 →
Change of Name
Jul 30, 2014
From: MII NEWCO, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 033449/0684 →
Confirmatory Assignment of Joint Patent Ownership
Apr 27, 2015
From: CANON NANOTECHNOLOGIES, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 035507/0559 →
Patent Security Agreement
Aug 22, 2019
From: MAGIC LEAP, INC.; MOLECULAR IMPRINTS, INC.; MENTOR ACQUISITION ONE, LLC
To: JP MORGAN CHASE BANK, N.A.
Reel/Frame 050138/0287 →
Assignment of Security Interest in Patents
Nov 7, 2019
From: JPMORGAN CHASE BANK, N.A.
To: CITIBANK, N.A.
Reel/Frame 050967/0138 →