Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
View Patent ↗The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.
1. A method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, said method comprising:
comparing spatial variations between features of said recorded pattern with respect to corresponding features of said reference pattern;
generating distortion vectors from location differences between said features in said recorded pattern and said corresponding features of said reference pattern; and
determining deformation forces from said distortion vectors to apply to said patterned device to attenuate said dimensional variations, with said forces having predetermined constraints, wherein a summation of a magnitude of said forces is substantially zero and a summation of moment of said forces is substantially zero.
2. The method as recited in claim 1 wherein said patterned device lies in a plane having a first and a second axis, said first axis being orthogonal to said second axis, with said summation of said magnitude of said forces being substantially zero with respect to said first and second axis and a summation of said moment of said forces is substantially zero with respect to a third axis, said third axis being orthogonal to said first and said second axis.
3. The method as recited in claim 1 wherein said patterned device comprises first and second opposed sides and third and fourth opposed sides, with a distance between said first and second opposed sides and a distance between said third and further opposed sides having a predetermined magnitude with a tolerance of 0.05 mm.
4. The method as recited in claim 3 wherein an angle between any two sides of said first, second, third, and fourth sides has a predetermined magnitude with a tolerance of 1E-3 Radians.
5. The method as recited in claim 4 wherein said patterned device comprises fifth side, said fifth side being orthogonal to said first, second, third, and fourth sides, said patterned device further comprising an edge surface between said fifth side and said first, second, third, and fourth sides, with a width of said edge surface having a predetermined magnitude with a tolerance of 0.2 mm.