Granted Patent B2

US 7,854,867 · App. 11/737,301 · Granted Dec 21, 2010

Abstract

Claims (15)

1. A method for detecting a particle between a nanoimprint mold assembly and a substrate in a nanoimprint lithography system, said method comprising:

positioning said nanoimprint mold assembly and said substrate in a desired spatial relationship using an imprint head and a stage, said nanoimprint mold assembly and said substrate being spaced-apart to define a desired distance and desired volume therebetween, said distance having an expected value and said volume substantially filled by polymerizable material;

measuring said distance between said nanoimprint mold assembly and said substrate employing encoder signals produced by said imprint head, defining a measured value of said distance, wherein measuring occurs after fluid has filled the volume between said nanoimprint mold assembly and said substrate;

comparing said measured value of said distance with said expected value of said distance, defining a difference between said measured value and said expected value; and

determining a presence of said particle between said nanoimprint mold assembly and said substrate based on said difference.

2. The method as recited in claim 1 wherein said measured value of said distance is greater than said expected value of said distance.

3. The method as recited in claim 1 further including the step of positioning a nanoimprint material between said mold and said substrate.

4. The method as recited in claim 3 further including the step of impinging actinic radiation upon said nanoimprint material.

5. The method as recited in claim 4 wherein comparing occurs prior to impinging said actinic radiation.

6. The method as recited in claim 1 wherein the step of comparing further comprises comparing said measured value of said distance with said expected value of said distance employing an algorithm.

7. The method as recited in claim 1 wherein the step of comparing further comprises comparing said measured value of said distance with said expected value of said distance employing a filter.

8. The method as recited in claim 1 wherein the step of comparing further comprises comparing said measured value of said distance with said expected value of said distance employing an adaptive filter.

9. The method as recited in claim 1 further including the step of filtering noise in said nanoimprint lithography system.

10. The method as recited in claim 9 wherein filtering further comprises applying a Kalman filter.

11. The method as recited in claim 9 wherein filtering further comprises applying an adaptive filter.

Assignments (11)