Patent Assignment
Reel/Frame 016133/0369
Security Interest
Recorded: 2005-01-11
Pages: 20
Assignor
MOLECULAR IMPRINTS, INC.
Executed: 2004-09-28
Assignee
VENTURE LENDING & LEASING IV, INC.
2010 NORTH FIRST STREET, SAN JOSE, CALIFORNIA, 95131
Covered Properties
(66)
Methods of Manufacturing a Lithography Template
Low viscosity high resolution patterning material
Application:
10/178,947 →
Publication:
US 2003/0235787
System and Method for Dispensing Liquids
Method for Imprint Lithography Using an Electric Field
Formation of Discontinuous Films During an Imprint Lithography Process
Step and Repeat Imprint Lithography Systems
Step and Repeat Imprint Lithography Processes
Alignment Methods for Imprint Lithography
Scatterometry Alignment for Imprint Lithography
Alignment Systems for Imprint Lithography
Method for Fabricating Bulbous-Shaped Vias
Functional Patterning Material for Imprint Lithography Processes
Method of forming a layer on a substrate to facilitate fabrication of metrology standards
Application:
10/264,926 →
Publication:
US 2004/0065252
Method to Arrange Features on a Substrate to Replicate Features Having Minimal Dimensional Variability
Method of Reducing Pattern Distortions During Imprint Lithography Processes
Chucking System for Modulating Shapes of Substrates
Methods of Inspecting a Lithography Template
Method for Modulating Shapes of Substrates
Method for Determining Characteristics of Substrate Employing Fluid Geometries
Method to Reduce Adhesion Between a Polymerizable Layer and a Substrate Employing a Fluorine-Containing Layer
Composition to Form a Release Layer
Application:
10/375,832 →
Publication:
US 2004/0168613
Positive Tone Bi-Layer Imprint Lithography Method
Method of Forming Stepped Structures Employing Imprint Lithography
Assembly and Method for Transferring Imprint Lithography Templates
Method, System and Holder for Transferring Templates During Imprint Lithography Processes
Patent:
6,805,054 →
Application:
10/438,224 →
High Resolution Overlay Alignment Systems for Imprint Lithography
Method to Reduce Adhesion Between a Conformable Region and a Pattern of a Mold
Conforming Template for Patterning Liquids Disposed on Substrates
Systems for Magnification and Distortion Correction for Imprint Lithography Processes
Capillary Imprinting Technique
Imprint Lithography Template Having Opaque Alignment Marks
Single Phase Fluid Imprint Lithography Method
Method of Forming Low Surface Energy Templates
Application:
10/687,519 →
Publication:
US 2005/0084804
Applying Imprinting Material to Substrates Employing Electromagnetic Fields
Methods for Fabricating Patterned Features Utilizing Imprint Lithography
Formation of conductive templates employing indium tin oxide
Application:
10/706,537 →
Publication:
US 2005/0098534
Dispense geometery to achieve high-speed filling and throughput
Application:
10/714,088 →
Publication:
US 2005/0106321
Magnification Correction Employing Out-of-Plane Distortion of a Substrate
Method to improve the flow rate of imprinting material
Application:
10/757,778 →
Publication:
US 2005/0156353
Thermal processing system for imprint lithography
Application:
10/758,384 →
Publication:
US 2005/0158419
Method for concurrently employing differing materials to form a layer on a substrate
Application:
10/760,821 →
Publication:
US 2005/0160011
Materials and methods for imprint lithography
Application:
10/763,885 →
Publication:
US 2005/0160934
Method and System to Measure Characteristics of a Film Disposed on a Substrate
Materials for Imprint Lithography
Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
Application:
10/788,700 →
Publication:
US 2005/0189676
Composition for an Etching Mask Comprising a Silicon-Containing Material
Method of forming a deep-featured template employed in imprint lithography
Application:
10/827,118 →
Publication:
US 2005/0230882
Compliant Hard Template for Uv Imprinting
Method of patterning a conductive layer on a substrate
Application:
10/843,194 →
Publication:
US 2005/0253307
Method of forming a recessed structure employing a reverse tone process
Application:
10/850,876 →
Method and system to control movement of a body for nano-scale manufacturing
Application:
10/858,100 →
Publication:
US 2005/0274219
Compliant device for nano-scale manufacturing
Application:
10/858,179 →
Publication:
US 2005/0275311
Method for dispensing a fluid on a substrate
Application:
10/858,566 →
Publication:
US 2005/0276919
System for Determining Characteristics of Substrates Employing Fluid Geometries
Chucking System for Modulating Shapes of Substrates
System for Dispensing Liquids
Imprint Alignment Method, System, and Template
Displays and method for fabricating displays
Application:
10/897,734 →
Publication:
US 2006/0017876
Method of Creating a Turbulent Flow of Fluid Between a Mold and a Substrate
System for Creating a Turbulent Flow of Fluid Between a Mold and a Substrate
Method of Planarizing a Semiconductor Substrate with an Etching Chemistry
Moat System for an Imprint Lithography Template
Composition to Provide a Layer with Uniform Etch Characteristics
Method to Provide a Layer with Uniform Etch Characteristics
System for Determining Characteristics of Substrates Employing Fluid Geometries
Apparatus for imprint lithography using an electric field
Application:
10/923,629 →
Publication:
US 2010/0053578
Related Assignments
(15)
Other recorded transfers of the patents in this record — the chain of ownership.
Correction of State of Incorporation of the Assignee Recited on the Assignment from Texas to Delaware
Nov 12, 2003
From: CHOI, BYUNG J.; MEISSL, MARIO J.; SREENIVASAN, SIDLGATA V.; WATTS, MICHAEL P.C.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 014680/0214 →
Correction of State of Incorporation of the Assignee Recited on the Assignment from Texas to Delaware Reel/Frame: 013576/0680
Nov 15, 2004
From: SREENIVASAN, SIDLGATA V.; BONNECAZE, ROGER T.; WILLSON, GRANT C.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 015982/0009 →
Release of Security Interest
Mar 27, 2007
From: VENTURE LENDING & LEASING IV, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 019072/0882 →
Release of Security Interest
Aug 29, 2011
From: VENTURE LENDING & LEASING III, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 026821/0159 →
Assignment of Assignor's Interest
Sep 1, 2011
From: MOLECULAR IMPRINTS, INC.
To: CANON INC.
Reel/Frame 026842/0929 →
Corrective Assignment to Correct the Nature of Conveyance from an "Assignment" to "Security Agreement" Previously Recorded on Reel 026842 Frame 0929. Assignor(S) Hereby Confirms the the Original Document Submitted Was a "Security Agreement".
Aug 13, 2013
From: MOLECULAR IMPRINTS, INC.
To: CANON INC.
Reel/Frame 031003/0031 →
Release of Security Interest
Jun 13, 2014
From: MOLECULAR IMPRINTS, INC.
To: CANON INC.
Reel/Frame 033161/0705 →
Corrective Assignment to Correct the Assignor and Assignee Previously Recorded on Reel 033161 Frame 0705. Assignor(S) Hereby Confirms the Assignment.
Jun 25, 2014
From: CANON INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 033227/0398 →
Assignment of Joint Ownership
Jul 15, 2014
From: MOLECULAR IMPRINTS, INC.
To: MII NEWCO, INC.
Reel/Frame 033329/0280 →
Change of Name
Jul 24, 2014
From: MOLECULAR IMPRINTS, INC.
To: CANON NANOTECHNOLOGIES, INC.
Reel/Frame 033400/0184 →
Change of Name
Jul 30, 2014
From: MII NEWCO, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 033449/0684 →
Confirmatory Assignment of Joint Patent Ownership
Apr 27, 2015
From: CANON NANOTECHNOLOGIES, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 035507/0559 →
Patent Security Agreement
Aug 22, 2019
From: MAGIC LEAP, INC.; MOLECULAR IMPRINTS, INC.; MENTOR ACQUISITION ONE, LLC
To: JP MORGAN CHASE BANK, N.A.
Reel/Frame 050138/0287 →
Assignment of Security Interest in Patents
Nov 7, 2019
From: JPMORGAN CHASE BANK, N.A.
To: CITIBANK, N.A.
Reel/Frame 050967/0138 →
Security Interest
Oct 28, 2025
From: MAGIC LEAP, INC.; MENTOR ACQUISITION ONE, LLC; MOLECULAR IMPRINTS, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073387/0487 →