Interferometric analysis for the manufacture of nano-scale devices
The present invention features a system to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The system senses relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
1. A system to determine relative spatial parameters between two coordinate systems, said system comprising:
a plurality of detection systems, each of which is configured to sense optical energy containing information corresponding to one of multiple alignment measurements and generate a signal in response
a processor in data communication with said plurality of detection systems to receive said signals and determine relative spatial parameters, said relative spatial parameters including a relative area and a relative shape; and
a memory in data communication with said processor with a sub-portion of said information concerning a series of periodic light intensities corresponding to superimposition of two periodic features, with said processor mapping said sub-portion into said memory as an array of values having n columns and m rows and, for a subset of said columns, obtaining an average of values of the rows corresponding thereto.
2. The system as recited in claim 1 wherein said relative spatial parameters further includes alignment and orientation.
3. The system as recited in claim 1 wherein said first coordinate system corresponds to a first substrate lying in a first plane and said second coordinate system corresponds to a second substrate lying in a second plane, spaced apart from said first plane.
4. The system of claim 3 wherein the spacing between the first and the second planes is less than 1 micron.
5. The system of claim 4 wherein the spacing between the first and the second planes is partially or completely filled with imprint fluid.
6. The system as recited in claim 1 wherein said first coordinate system is defined by a first set of gratings disposed on a first substrate and said second coordinate system is defined by a second set of gratings disposed on a second substrate in superimposition with said first set of gratings.
7. The system as recited in claim 1 wherein said first coordinate system is defined by a first set of gratings, periodic along a first direction, disposed on a first substrate and said second coordinate system is defined by a second set of gratings, periodic in two orthogonal directions, disposed on a second substrate in superimposition with said first set of gratings.
8. The system as recited in claim 1 wherein said first coordinate system is defined by a first set of gratings disposed on a first substrate and a subset of said detection systems includes a source of illumination and a detector, with said source directing energy along a path to impinge upon a region or said substrate, with said detector sensing energy, returning from said region and propagating along said path.
9. The system as recited in claim 1 wherein The system as recited in claim 1 wherein said first coordinate system is defined by a first set of gratings disposed on a first substrate and a subset of said detection systems includes a source of illumination and a detector, with said source directing energy along a path to impinge upon said first set of gratings, creating first order diffraction energy, with said detector configured to sensing said first order diffraction energy propagating along said path.
10. A system to determine relative spatial relative parameters between two coordinates system, said system comprising:
a plurality of detection systems, each of which is configured to sense optical energy containing information corresponding to one of multiple relative spatial parameters between two coordinate systems and generate a signal in response, said relative spatial parameters including a relative area and a relative shape, relative alignment and relative orientation, with the information contained in the optical energy sensed by a subset of said plurality of detection systems differs from the information contained in the optical energy sensed by the remaining detection systems of said plurality of detection systems;
a processor in data communication with said plurality of detection systems to receive said signal and determine said relative spatial parameters; and
a memory in data communication with said processor with a sub-portion of said information concerning a series of periodic light intensities corresponding to superimposition of two periodic features, with said processor mapping said sub-portion into said memory as an array of values having n columns and m rows and, for a subset of said columns, obtaining an average of values of the rows corresponding thereto.
11. The system as recited in claim 10 where said plurality of detection system comprises six detection systems.
12. The system as recited in claim 10 wherein said first coordinate system corresponds to a first substrate lying in a first plane and said second coordinate system corresponds to a second substrate lying in a second plane, spaced apart from said first plane.
13. The system of claim 11 wherein the spacing between the first and the second planes is less than 1 micron.
14. The system of claim 11 wherein the spacing between the first and the second planes is partially or completely filled with imprint fluid.
15. The system as recited in claim 10 wherein said first coordinate system is defined by a first set of gratings disposed on a first substrate and said second coordinate system is defined by a second set of gratings disposed on a second substrate in superimposition with said first set of gratings.
16. The system as recited in claim 10 wherein said first coordinate system is defined by a first set of gratings, periodic along a first direction, disposed on a first substrate and said second coordinate system is defined by a second set of gratings, periodic in two orthogonal directions, disposed on a second substrate in superimposition with said first set of gratings.
17. The system as recited in claim 10 wherein said first coordinate system is defined by a first set of gratings disposed on a first substrate and a subset of said detection systems includes a source of illumination and a detector, with said source directing energy along a path to impinge upon a region of said substrate, with said detector sensing energy, returning from said region and propagating along said path.
18. The system as recited in claim 10 wherein The system as recited in claim 1 wherein said first coordinate system is defined by a first set of grating disposed on a first substrate and a subset of said detection systems includes a source of illumination and a detector, with said source directing energy along a path to impinge upon said first set of gratings, creating first order diffraction energy, with said detector configured to sensing said first order diffraction energy propagating along said path.
19. A system to determine, relative spatial parameters between two substrates in an imprint lithography system, the system comprising:
a first one of the two substrates having an imprint lithography fluid deposited thereon;
a second one of the two substrates comprising a template having an imprint lithography mold for imprinting a pattern into the imprint lithography fluid;
UV source positioned to emit a UV beam to cure the imprint lithography fluid; and
multiple image capturing units for determining relative spatial parameters between the two substrates, the multiple image capturing units capturing morié images that are diffracted into oblique vectors that are normal to an axis of measuring data, wherein the multiple image capturing units are positioned outside of a path of the UV beam.
20. The system as recited in claim 19 wherein the image capturing units image moiré patterns as a gap between two overlapping marks changes from 100 microns to less than 10 nm.
21. The system as recited in claim 19 wherein the image capturing units image obliquely diffracted moiré patterns as a patterning area is undergoing exposure to the UV beam.
22. The system as cited in claim 19 wherein the image capturing units image obliquely diffracted moiré patterns as a patterning area is filled with air or imprinting fluid.
23. The system as recited in claim 19 , wherein each image capturing unit is positioned on a two degree-of-freedom stage with position feedback.