Formation of discontinuous films during an imprint lithography process
View Patent ↗The present invention is directed to a template having a body including a surface with first and second regions. The first region has first wetting characteristics for a given material and the second region has second wetting characteristics for the given material. The first wetting characteristics differ from the second wetting characteristics. Specifically, the first region is formed from a surface treatment layer with a first surface energy to provide the first wetting characteristics. The second region is exposed portions of the body, typically quartz of fused silica, having a second surface energy associated therewith. The second surface energy is greater than the first surface energy to provide the second region with the second wetting characteristics.
1. A template for use in imprint lithography comprising:
a body having a surface with first and second regions, said first region having an imprinting pattern for contacting an active region of a wafer and forming said pattern in a polymer fluid, said second region not having said imprinting pattern, with said first region having first wetting characteristics for said polymer fluid and said second region having second wetting characteristics for said polymer fluid, with said first wetting characteristics differing from said second wetting characteristics.
2. The template as recited in claim 1 where said first region has a first surface energy associated therewith and said second region has a second surface energy associated therewith greater than said first surface energy.
3. The template as recited in claim 1 wherein said first region includes a first treatment layer and said second region includes a second surface treatment layer.
4. The template as recited in claim 1 further including an additional surface disposed opposite to said surface, with said first region being spaced-apart from said additional surface a distance greater than a distance that said second region is spaced-apart from said additional surface.
5. The template as recited in claim 3 wherein said first region includes a plurality of recesses.
6. The template as recited in claim 3 wherein said second region is substantially smooth.
7. The template as recited in claim 1 wherein said first region includes a silynated layer disposed thereon.
8. The template as recited in claim 1 wherein said body is formed from materials selected from a set of materials consisting essentially of quartz and fused silica.
9. A template for use imprint lithography comprising:
a body having a surface with first and second regions, said first region having an imprinting pattern for contacting an active region of a wafer and forming said pattern in a polymer fluid, said second region not having said imprinting pattern, with said first region having a first surface energy associated therewith and said second region having a second surface energy associated therewith that is greater than said first surface energy.
10. The template as recited in claim 9 wherein said surface treatment layer comprises a product of a chemical reaction between water and chemicals selected from a set of chemicals consisting essentially of alkylsilane, fluoroalkylsilane, fluoroalkyltrichlorosilane and tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane.
11. The template as recited in claim 9 wherein said template is formed from materials selected from a set of materials consisting essentially of quartz and fused silica, with said first region having a silynated surface treatment layer disposed thereon.
12. The template as recited in claim 11 wherein said second region is exposed portions of said body.
13. The method of claim 9 wherein the first region has a surface energy that is 25 dynes/cm to 45 dynes/cm less than a surface energy of said second region measured at 250° Celsius.
14. A template for use in imprint lithography comprising:
a body formed from fused silica and having a surface with first and second regions, said first region having an imprinting pattern for contacting an active region of a wafer and forming said pattern in a polymer fluid, said second region not having said imprinting pattern, with said first region having a surface treatment layer providing a first surface energy to facilitate first wetting characteristics for said polymer fluid and said second region being exposed fused-silica having a second surface energy associated therewith that is greater than said first surface energy to provide said second region with second wetting characteristics for said polymer fluid.
15. The template as recited in claim 14 further including an additional surface disposed opposite to said surface, with said first region including a layer of indium tin oxide disposed between said additional side and said surface treatment layer.
16. The template as recited in claim 15 wherein said first region includes a plurality of recesses.
17. The template as recited in claim 9 wherein said surface treatment layer is formed of a silynated compound.
18. The template as recited in claim 17 wherein said surface treatment layer comprises a product of a chemical reaction between water and chemicals selected from a set of chemicals consisting essentially of alkylsilane, fluoroalkylsilane, fluoroalkyltrichlorosilane and tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane.