Granted Patent B2

US 7,462,028 · App. 11/695,263 · Granted Dec 9, 2008

Abstract

Claims (10)

1. A system for creating a specific environment during a nanolithography imprinting process, comprising:

a substrate disposed on a chuck surface;

a template stage having an air bearing reference surface;

an air bearing surface disposed around the substrate and interfacing with the air bearing reference surface creating an interface gap;

a template coupled to the template stage and positioned in close proximity to the substrate creating a controlled volume surrounding a nano-imprint mold on the template and the substrate; and

a means for creating a partial vacuum in the controlled volume surrounding the nano-imprint mold and the substrate thereby enabling a gas flow through the interface gap and the controlled volume to create the specific environment in the controlled volume.

2. The system as recited in claim 1 , wherein the template comprises a plurality of holes positioned around the nano-imprint mold and passing through the template and the creating means utilizes the plurality of holes to create the partial evacuation of gas in the controlled volume surrounding the nano-imprint mold and the substrate.

3. The system as recited in claim 1 , wherein the template further comprises a channel formed in the template around the nano-imprint mold, the channel coupled to the creating means.

4. The system as recited in claim 1 , wherein the creating means further comprises a body with the air bearing surface positioned around the template in a configuration that creates the interface gap between sides of the template and sides of the body whereby air flow up through the interface gap evacuates gas from between the template and the substrate.

5. The system as recited in claim 1 , further comprising a polymerizable fluid dispensed between the nano-imprint mold and the substrate.

Assignments (12)