Step and repeat imprint lithography processes
View Patent ↗Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.
1. A method of forming a continuous layer on a region of a substrate, the method comprising:
dispensing drops of liquid in a continuous pattern on the substrate;
placing an imprint lithography template having a mold spaced-apart from the substrate; and
contacting the liquid with the mold;
applying a force to initiate spread of liquid;
curing the liquid forming a masking layer on the substrate;
applying a vacuum force between the mold and the substrate prior to separation of the mold and the masking layer; and,
separating the mold and the masking layer.
2. The method as recited in claim 1 , further including applying pressurized gas between the mold and the substrate during separation of the mold and the masking layer.
3. The method as recited in claim 1 , wherein the mold is in superimposition with the region of the substrate.
4. The method as recited in claim 1 , wherein the mold and the masking layer are separated using a peel and pull process.
5. The method as recited in claim 1 , wherein contacting further includes ascertaining a first surface energy at a mold-liquid interface and a second surface energy at a mold-liquid interface, with the first and second surface energies facilitating control of the position of the layer in superimposition with the region.
6. The method as recited in claim 1 , wherein curing includes impinging actinic energy upon the liquid.
7. A method of forming a continuous layer on a region of a substrate with a mold having a plurality of features, the method comprising:
positioning a plurality of drops of liquid in a pattern on the substrate, the drops having a volume to substantially fill the features, on the substrate; and
contacting the liquid with the mold; and,
applying a force to initiate spread of liquid drops; and,
defining a gap between the mold and the substrate;
curing the liquid forming a masking layer on the substrate;
applying pressurized gas between the mold and the substrate after curing and during separation of the mold and the masking layer; and,
separating the mold and the masking layer.
8. The method as recited in claim 7 , further including positioning the mold spaced-apart a distance from the substrate, with the distance being substantially equal to the gap.
9. The method as recited in claim 7 , further including applying a vacuum force between the mold and the substrate prior to curing of the liquid.
10. The method as recited in claim 7 , wherein the mold is in superimposition with the region of the substrate.
11. The method as recited in claim 7 , wherein contacting further includes preventing the layer from being in superimposition with an additional region of the substrate, with the additional region being outside of the region.
12. The method as recited in claim 7 , wherein contacting further includes filling the gap with the liquid.
13. The method as recited in claim 7 , wherein contacting further includes ascertaining a first surface energy at a mold-liquid interface and a second surface energy at a substrate-liquid interface, with the first and second surface energies facilitating control of the position of the layer in superimposition with the region.
14. The method as recited in claim 7 , wherein curing includes impinging actinic energy upon the liquid.
15. A method of forming a continuous layer on a region of a substrate, the method comprising:
dispensing a volume of drops of liquid in a pattern on the substrate;
contacting the liquid with an imprint lithography template, the imprint lithography template having a body with a lower surface and a plurality of recesses on the lower surface extending toward the top surface of the body, wherein at least one recess projects entirely through the body of the imprint lithography template forming at least one opening in the imprint lithography template;
applying a force to initiate spread of the liquid;
defining a gap between the imprint lithography template and the substrate;
curing the liquid forming a masking layer on the substrate;
applying pressurized gas to the opening after curing and during separation of the imprint lithography template and the masking layer; and,
separating the imprint lithography template and the masking layer.
16. The method as recited in claim 15 , wherein placing the contacting the liquid with the imprint lithography template further including placing the template in superimposition with the region of the substrate.
17. The method as recited in claim 15 , further including applying a vacuum force to the opening prior to curing of the liquid.
18. The method as recited in claim 16 , wherein the mold and the masking layer are separated using a peel and pull process.
19. The method as recited in claim 16 , further including applying pressurized gas to the opening prior to curing of the liquid.