Nanoimprint lithography processes for forming nanoparticles
View Patent ↗A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.
1. A nanoimprint lithography method comprising:
forming a patterned layer on a multilayer substrate, the multilayer substrate comprising a removable layer, wherein the removable layer comprises a water-soluble, non-toxic polymer with functional groups selected from the group consisting of carboxyl groups, nitrogen-containing groups, epoxide groups, hydroxyl groups, and polyethylene oxide groups;
etching the patterned layer and portions of the multilayer substrate including the removable layer to transfer features from the patterned layer into the removable layer, wherein the etched removable layer comprises exposed protrusions and recessions;
disposing a polymerizable material on the etched removable layer to fill the recessions and cover the protrusions of the etched removable layer;
solidifying the polymerizable material to form pillars of the polymerized material in the recessions of the removable layer and to form a layer of polymerized material over the removable layer;
removing a portion of the polymerized material to expose the protrusions of the etched removable layer; and
releasing the pillars from the removable layer to form nanoparticles comprising the polymerized material.
2. The method of claim 1 , wherein forming the patterned layer on the multilayer substrate comprises:
disposing a second polymerizable material on the multilayer substrate;
contacting the second polymerizable material with a nanoimprint lithography template; and
solidifying the second polymerizable material to form the patterned layer on the multilayer substrate.
3. The method of claim 1 , wherein solidifying the polymerizable material to form pillars of the polymerized material in the recessions of the removable layer and to form a layer of polymerized material over the removable layer comprises contacting the polymerizable material with a nanoimprint lithography template and exposing the polymerizable material to ultraviolet radiation through the nanoimprint lithography template.
4. The method of claim 1 , wherein the polymerizable material disposed on the etched removable layer is a functional material.
5. The method of claim 4 , wherein the functional material is biocompatible.
6. The method of claim 1 , wherein the nanoparticles have a cross-sectional shape selected from the group consisting of round, triangular, and rectangular.
7. The method of claim 1 , wherein releasing the pillars from the removable layer to form nanoparticles comprising the polymerized material comprises dissolving the removable layer.
8. The method of claim 1 , wherein a dimension of the nanoparticles is less than 100 nm.
9. A nanoimprint lithography method comprising:
forming a patterned layer on a multilayer substrate, the multilayer substrate comprising:
a removable layer comprising a water-soluble, non-toxic polymer with functional groups selected from the group consisting of carboxyl groups, nitrogen-containing groups, epoxide groups, hydroxyl groups, and polyethylene oxide groups; and
a functional layer comprising functional material;
etching portions of the patterned layer and portions of the multilayer substrate to expose at least a portion of the removable layer, wherein the etched multilayer substrate comprises multilayer protrusions capped with portions of the patterned layer;
removing the portions of the patterned layer from the multilayer protrusions to expose pillars comprising the functional material; and
releasing the pillars from the removable layer to form nanoparticles comprising the functional material.
10. The method of claim 9 , wherein forming the patterned layer on the multilayer substrate comprises:
disposing a polymerizable material on the multilayer substrate;
contacting the polymerizable material with a nanoimprint lithography template; and
solidifying the polymerizable material to form the patterned layer on the multilayer substrate.
11. The method of claim 9 , wherein the functional material is biocompatible.
12. The method of claim 9 , wherein the nanoparticles have a cross-sectional shape selected from the group consisting of round, triangular, and rectangular.
13. The method of claim 9 , wherein releasing the pillars from the removable layer to form nanoparticles comprising the functional material comprises dissolving the removable layer.
14. The method of claim 9 , wherein a dimension of the nanoparticles is less than 100 nm.