IP Library Granted Patent US 8,846,195
Granted Patent B2
US 8,846,195 · App. 12/326,709 · Granted Sep 30, 2014

Ultra-thin polymeric adhesion layer

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Quick Facts
Patent No.
US 8,846,195
App. No.
12/326,709
Granted
Sep 30, 2014
Kind
B2
Abstract

An imprint lithography imprinting stack includes a substrate and a polymeric adhesion layer adhered to the substrate. The polymeric adhesion layer includes polymeric components with an extended backbone length of at least about 2 nm. The backbones of the polymeric components may be substantially aligned in a planar configuration on the surface of the substrate, such that a thickness of the polymeric adhesion layer is less than about 2 nm.

Claims (24)

1. An imprint lithography imprinting stack comprising:

a substrate;

a polymeric adhesion layer adhered to the substrate, wherein the polymeric adhesion layer is formed from a polymerizable composition comprising a polymeric component, the polymeric component comprising a repeating aromatic group, and wherein a thickness of the polymeric adhesion layer is less than about 2 nm.

2. The imprinting stack of claim 1 , wherein the thickness of the polymeric adhesion layer is about 1 nm.

3. The imprinting stack of claim 1 , wherein the polymeric component has an extended backbone length of at least about 2 nm.

4. The imprinting stack of claim 3 , wherein the polymeric component is synthesized from a cresol epoxy novolac.

5. The imprinting stack of claim 3 , wherein the polymeric component comprises a carboxyl group capable of bonding to the substrate and an additional functional group capable of bonding with an imprint resist.

6. The imprinting stack of claim 1 , wherein the polymeric adhesion layer is capable of bonding with an imprint resist during solidification of the imprint resist on the imprinting stack.

7. A method of forming an adhesion layer on an imprint lithography substrate, the method comprising:

spin-coating a polymerizable composition onto an imprint lithography substrate; and

solidifying the polymerizable composition to form a polymeric adhesion layer adhered to the imprint lithography substrate, wherein the polymerizable composition comprises a polymeric component, the polymeric component comprising a repeating aromatic group, and wherein a thickness of the polymeric adhesion layer is less than about 2 nm.

8. The method of claim 7 , wherein the thickness of the polymeric adhesion layer is about 1 nm.

9. The method of claim 7 , wherein the polymeric component has an extended backbone length of at least about 2 nm.

10. The method of claim 7 , wherein the polymeric component is synthesized from a cresol epoxy novolac.

11. The method of claim 7 , wherein the polymerizable composition comprises a polymeric component, and the polymeric component comprises a carboxyl group capable of bonding to the substrate and an additional functional group capable of bonding with an imprint resist.

12. The method of claim 7 , further comprising applying an imprint resist to the polymeric adhesion layer and solidifying the imprint resist, wherein solidifying the imprint resist comprises bonding the imprint resist to the polymeric adhesion layer.

13. An imprint lithography method comprising:

spin-coating a polymerizable composition on an imprint lithography substrate, wherein the polymerizable composition comprises polymeric components, each polymeric component comprising a repeating aromatic group and having an extended backbone length of at least about 2 nm;

substantially aligning the backbones of the polymeric components in a planar configuration on the surface of the imprint lithography substrate; and

solidifying the polymerizable composition to form a polymeric adhesion layer adhered to the imprint lithography substrate, wherein a thickness of the polymeric adhesion layer is less than about 2 nm.

14. The method of claim 13 , wherein the thickness of the polymeric adhesion layer is about 1 nm.

15. The method of claim 13 , wherein the polymeric component is synthesized from a cresol epoxy novolac.

16. The method of claim 13 , wherein the polymeric component comprises a carboxyl group capable of bonding to the substrate and an additional functional group capable of bonding with an imprint resist.

17. The method of claim 13 , wherein the polymeric adhesion layer is capable of bonding with an imprint resist during solidification of the imprint resist on the imprinting stack.

Assignments (7)
ASSIGNMENT OF SECURITY INTEREST IN PATENTS Recorded Nov 7, 2019
From: JPMORGAN CHASE BANK, N.A.
To: CITIBANK, N.A.
Reel/Frame 050967/0138 →
PATENT SECURITY AGREEMENT Recorded Aug 22, 2019
From: MAGIC LEAP, INC.; MOLECULAR IMPRINTS, INC.; MENTOR ACQUISITION ONE, LLC
To: JP MORGAN CHASE BANK, N.A.
Reel/Frame 050138/0287 →
CONFIRMATORY ASSIGNMENT OF JOINT PATENT OWNERSHIP Recorded Apr 27, 2015
From: CANON NANOTECHNOLOGIES, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 035507/0559 →
CHANGE OF NAME Recorded Jul 30, 2014
From: MII NEWCO, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 033449/0684 →
CHANGE OF NAME Recorded Jul 24, 2014
From: MOLECULAR IMPRINTS, INC.
To: CANON NANOTECHNOLOGIES, INC.
Reel/Frame 033400/0184 →
ASSIGNMENT OF JOINT OWNERSHIP Recorded Jul 15, 2014
From: MOLECULAR IMPRINTS, INC.
To: MII NEWCO, INC.
Reel/Frame 033329/0280 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2009
From: XU, FRANK Y., DR.; FLETCHER, EDWARD BRIAN, MR.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 022111/0890 →