Nano-imprint lithography templates
View Patent ↗Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
1. A method of forming a porous nano-imprint lithography template, the method comprising:
forming a nano-imprint lithography mask on a fused silica nano-imprint lithography template;
etching the nano-imprint lithography template to form recesses in the template;
adjusting a volume of the recesses;
cleaning the nano-imprint lithography template;
depositing a conformal oxide layer over the recesses;
removing a top portion of the conformal oxide layer to leave conformal oxide plugs in the recesses; and
etching the conformal oxide plugs to predetermined depth.
2. The method of claim 1 , further comprising protecting side walls of the recesses before adjusting a volume of the recesses.
3. The method of claim 1 , wherein adjusting a volume of the recesses comprises isotropically etching a bottom of the recesses to enlarge a volume of the recesses.