Vapor Delivery System For Use in Imprint Lithography
Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.
1 . A vapor delivery system for delivering a vaporized adhesive material to a substrate for use in an imprint lithography process, the system comprising:
a reactor chamber configured to retain one or more substrates, the reactor chamber in fluid communication with a vacuum source and further including one or more inlets;
a fluid retention reservoir configured to retain liquid adhesive material;
a delivery line connecting the fluid retention reservoir to the one or more inlets of the reaction chamber; and
an inline vaporizer positioned along the delivery line, the inline vaporizer further comprising one or more small diameter coiled tubes.
2 . The vapor delivery system of claim 1 further comprising a baffle positioned along the delivery line between the vaporizer and the reactor chamber.
3 . The vapor delivery system of claim 1 further comprising one or more purge valves located along the delivery line.
4 . The vapor delivery system of claim 1 further comprising a N 2 purge line connected to the delivery line between the fluid retention reservoir and the vaporizer.
5 . The vapor delivery system of claim 1 further comprising a vacuum bypass line connected to the delivery line between the vaporizer and the reactor.
6 . The vapor delivery system of claim 1 further comprising a heating element for heating any one or more of the fluid retention reservoir, vaporizer and reactor.
7 . The vapor delivery system of claim 1 further comprising multiple inline vaporizers.
8 . The vapor delivery system of claim 1 further comprising a bulk storage reservoir in fluid communication with the retention reservoir.
9 . The vapor delivery system of claim 8 further comprising a flow controller located between the bulk storage reservoir and the retention reservoir for controlling flow of liquid adhesive material from the bulk storage reservoir to the retention reservoir.
10 . A vapor delivery system for delivering a vaporized adhesive material to a substrate for use in an imprint lithography process, the system comprising:
a reactor chamber configured to retain one or more substrates, the reactor chamber in fluid communication with a vacuum source and further including one or more inlets;
a fluid retention reservoir configured to retain liquid adhesive material;
a bulk storage reservoir in fluid communication with the fluid retention reservoir;
a flow controller located between the bulk storage reservoir and the retention reservoir for controlling flow of liquid adhesive material from the bulk storage reservoir to the retention reservoir
a delivery line connecting the fluid retention reservoir to the one or more inlets of the reaction chamber;
an inline vaporizer positioned along the delivery line, the inline vaporizer further comprising one or more small diameter coiled tubes; and
a baffle positioned along the delivery line between the vaporizer and the reactor chamber.
11 . The vapor delivery system of claim 10 further comprising a N 2 purge line connected to the delivery line between the fluid retention reservoir and the vaporizer.
12 . The vapor delivery system of claim 10 further comprising a vacuum bypass line connected to the delivery line between the vaporizer and the reactor.
13 . The vapor delivery system of claim 10 further comprising multiple inline vaporizers.
14 . A method for delivering a vaporized adhesive material to a substrate for use in an imprint lithography process, the method comprising:
providing adhesive material in liquid form to a reservoir;
heating the reservoir to produce gaseous adhesive material;
directing the gaseous adhesive material through one or more small diameter coiled tubes to produce vaporized adhesive material;
directing the vaporized adhesive material to a reactor chamber, the reactor chamber containing one or more substrates;
allowing the vaporized adhesive material to deposit on the one or more substrates.
15 . The vapor delivery method of claim 14 further comprising directing the vaporized adhesive material through a baffle prior to directing the vaporized adhesive material to the reactor chamber.
16 . The vapor delivery method of claim 14 further comprising restricting the flowrate of the vaporized adhesive material to increase vaporization efficiency.
17 . The vapor delivery method of claim 14 further comprising directing the vaporized adhesive material through multiple small diameter coiled tubes.
18 . The vapor delivery method of claim 14 further comprising subjecting the vaporized adhesive material to a vacuum.
19 . The vapor delivery method of claim 14 further comprising providing a bulk storage reservoir in fluid communication with the reservoir to provide the liquid adhesive material to the reservoir.
20 . The vapor delivery method of claim 18 wherein the bulk storage reservoir is kept at ambient temperature.
21 . The vapor delivery method of claim 14 further comprising heating any one or more of the fluid retention reservoir, vaporizer and reactor.
22 . The vapor delivery method of claim 14 wherein the adhesive material further comprises a silane compound having a functional group capable of covalently bonding to a polymerizable material typically used in an imprint lithography process, a —CH 2 — linker group, and an Si atom having hydrolizable leaving groups.
23 . The vapor delivery method of claim 14 wherein the adhesive material further comprises acryloxymethyltrimethoxysilane.