Alignment for edge field nano-imprinting
View Patent ↗Systems and methods for alignment of template and substrate at the edge of substrate are described.
1. A method, comprising:
positioning alignment measurement units in optical communication with a first set of field alignment marks on a first field of a substrate, the first field having a plurality of sub-fields with each sub-field having a second set of sub-field alignment marks contained within each sub-field;
identifying one or more potentially yielding sub-fields within the field;
retaining at least one alignment measurement unit in optical communication with at least one field alignment mark; and,
repositioning one or more alignment measurement units to be in optical communication with one or more of the second set of alignment marks contained within the one or more potentially yielding sub-fields.
2. The method of claim 1 , wherein alignment marks of the first set are positioned on outer boundaries of the field.
3. The method of claim 1 , wherein alignment marks of the second set are positioned on outer boundaries of the sub-field.
4. The method of claim 1 , wherein alignment measurement units are repositioned outside of a beam path from an energy source focused through a template.
5. The method of claim 1 , further comprising repositioning one or more alignment measurement units to be in optical communication with a third set of alignment marks of a second field, the second field positioned adjacent to the first field.
6. The method of claim 1 , further comprising providing one or more additional alignment measurement units in optical communication with second set of alignment marks.
7. The method of claim 1 , wherein the alignment measurement units are positioned on a scanning stage.
8. The method of claim 1 , further comprising collecting alignment data from phase information using the second set of alignment marks and overlaying template alignment marks positioned on an imprint lithography template.
9. The method of claim 7 , wherein the scanning stage includes a first direction stage and a second direction stage, the first direction stage and the second direction stage each having an open area, the open area providing a beam path for an energy source focused through the substrate.
10. The method of claim 8 , further comprising capturing images by diffracting light from one of the second set of alignment marks or the overlaying template alignment marks.
11. The method of claim 9 , wherein the first direction stage is adapted to reposition alignment measurement units in an x-direction.
12. The method of claim 9 , wherein the second direction stage is adapted to reposition alignment measurement units in a y-direction.
13. The method of claim 10 , wherein normal distance between the second set of alignment marks and the template overlaying template alignment marks may be altered from 100 microns to less than 10 nm.
14. The method of claim 10 , further comprising determining relative spatial parameters between the substrate and the imprint lithography template using the images.
15. The method of claim 14 , wherein the spatial parameters include alignment parameters and exclude magnification parameters.
16. The method of claim 15 , wherein the second set of alignment marks provides X and Y values for alignment.
17. The method of claim 16 , further comprising determining theta value using a theta measuring unit.