Alignment system and method for a substrate in a nano-imprint process

1. A method, comprising:

placing a sensor system over a substrate positioned on a chuck, the sensor system generating a beam of optical energy towards the substrate and configured to receive optical energy deflected from the substrate;

generating, by the sensor system, sensor signals in response to variations in received optical energy from the substrate and the chuck, the chuck having a first surface and an edge of the substrate having a second surface such that the first surface directs a beam substantially to the sensor system, and the second surface directs a beam substantially away from the sensor system providing the variations in received optical energy.

2. The method of claim 1 , wherein the edge of the substrate is configured with a chamfer.

3. The method of claim 2 , wherein an angle of the chamfer results in less optical energy being received by the sensor system.

4. The method of claim 1 , further comprising processing the sensor signals in a controller to locate in-stage position coordinates of the substrate.

5. The method of claim 4 , imprinting an active area on the substrate subsequent to locating the in-stage position coordinates of the substrate.

6. The method of claim 1 , wherein the sensor system includes a laser light emitter configured to generate the beam of optical energy.

7. The method of claim 1 , wherein the sensor system includes a photo detector sensitive to a frequency of optical energy.

8. The method of claim 7 , wherein the photo detector includes an angular window.

9. The method of claim 1 , wherein the sensor system includes an emitter and a photo detector relatively positioned such that only optical energy deflected within a predetermined angular window from the substrate and the chuck impinges on the photo detector.

10. The method of claim 1 , wherein the first surface of the chuck includes at least one incline.

11. The method of claim 1 , wherein the sensor system includes an emitter and a detector and an incline of the first surface of the chuck is substantially equal to one half an angle between the emitter and the detector.

12. The method of claim 1 , wherein the substrate is positioned on the chuck such that an inner edge of the substrate overlaps at least a portion of an incline of the first surface.

13. The method of claim 1 , further comprising processing the sensor signals in a controller to locate in-stage position coordinates of the substrate; and determining a center location of the substrate.

14. The method of claim 1 , further comprising processing the sensor signals in a controller to locate in-stage position coordinates of the substrate; and determining a diameter of the substrate.

15. A method, comprising:

placing a sensor system over a substrate positioned on a chuck, the sensor system generating a beam of optical energy towards the substrate and configured to receive optical energy deflected from the substrate;

generating, by the sensor system, sensor signals in response to variations in received optical energy from an edge of the substrate and a surface of the chuck, such that the surface of the chuck directs a beam substantially to the sensor system, and the edge of the substrate directs a beam substantially away from the sensor system providing the variations in received optical energy.

16. The method of claim 15 , further comprising processing the sensor signals in a controller to locate in-stage position coordinates of the substrate.

17. The method of claim 15 , further comprising processing the sensor signals in a controller to locate in-stage position coordinates of the substrate; and, determining a center location of the substrate.

18. The method of claim 15 , further comprising processing the sensor signals in a controller to locate in-stage position coordinates of the substrate; and, determining a diameter of the substrate.

19. A method, comprising:

placing a sensor system over a substrate positioned on a chuck, the sensor system generating a beam of optical energy towards the substrate and configured to receive optical energy deflected from the substrate;

generating, by the sensor system, sensor signals in response to variations in received optical energy from an edge of the substrate and a surface of the chuck, such that the surface of the chuck directs a beam substantially to the sensor system, and the edge of the substrate directs a beam substantially away from the sensor system providing the variations in received optical energy;

processing the sensor signals in a controller to locate in-stage position coordinates of the substrate; and,

positioning the substrate with respect to a template mold using in-stage position coordinates of the substrate.

20. The method of claim 19 , further comprising imprinting an active area on the substrate using the template mold.