Nano-imprint lithography templates
View Patent ↗Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
1. A nano-imprint lithography template comprising:
a nano-imprint lithography substrate layer;
a patterned nano-imprint lithography substrate layer; and
a multiplicity of posts extending between the substrate layer and the patterned substrate layer,
wherein the patterned substrate layer is permeable to a gas, and spacings between the posts define reservoirs capable of accepting the gas.
2. The template of claim 1 , wherein the posts have a width between about 10 nm and about 1 μm and a height between about 10 nm and about 300 nm.
3. The template of claim 1 , wherein a density of the posts is between about 30% and about 70%.
4. The template of claim 1 , wherein the patterned substrate layer is bonded to the posts.
5. A method of making the template of claim 1 , the method comprising:
providing the nano-imprint lithography substrate layer;
forming the multiplicity of posts on the nano-imprint lithography substrate layer;
providing the patterned nano-imprint lithography substrate layer; and
bonding the patterned nano-imprint lithography substrate layer onto the multiplicity of posts.
6. The method of claim 5 wherein the forming the multiplicity of posts on the nano-imprint lithography substrate layer further comprises forming a pattern consisting of a multiplicity of posts over the nano-imprint lithography substrate and transferring the pattern into the nano-imprint lithography substrate.
7. The method of claim 5 further comprising thinning, polishing or planarizing the patterned nano-imprint lithography substrate layer after bonding the patterned nano-imprint lithography substrate layer to the nano-imprint lithography substrate layer.
8. The method of claim 5 further comprising patterning the patterned nanoimprint lithography substrate layer with a plurality of features after bonding the patterned nano-imprint lithography substrate layer to the nano-imprint lithography substrate layer.
9. The method of claim 5 further comprising oxidizing the patterned nanoimprint lithography substrate layer.
10. The method of claim 5 further comprising depositing a layer of porous filling material over the multiplicity of posts and subsequently removing excess porous filling material to expose the multiplicity of posts prior to bonding the patterned nano-imprint lithography substrate layer onto the multiplicity of posts.
11. The method of claim 10 further comprising depositing a porous layer over the filling material and exposed multiplicity of posts prior to bonding the patterned nano-imprint lithography substrate layer onto the multiplicity of posts.
12. The method of claim 11 further comprising removing the filling material by decomposing the filling material to a gas phase and extracting the gaseous filling material through the porous layer.
13. A method of making the template of claim 1 , the method comprising:
providing the nano-imprint lithography substrate layer;
forming the multiplicity of posts on the nano-imprint lithography substrate layer;
depositing a layer of porous filling material over the multiplicity of posts;
removing excess filling material to expose the multiplicity of posts;
depositing a porous layer over the filling material and the exposed multiplicity of posts;
decomposing the filling material to a gas phase;
extracting the gaseous filling material through the porous layer;
bonding a second nano-imprint lithography substrate layer onto porous layer; and
patterning the second nano-imprint lithography substrate layer to form the patterned nano-imprint lithography substrate layer.
14. The method of claim 13 wherein the forming the multiplicity of posts on the nano-imprint lithography substrate layer further comprises forming a pattern consisting of a multiplicity of posts over the nano-imprint lithography substrate and transferring the pattern into the nano-imprint lithography substrate.
15. The method of claim 13 wherein the filling material is thermally stable up to 250° C.
16. The method of claim 15 wherein the filling material decomposes when heated above 250° C.
17. The method of claim 16 wherein the filling material is polyethylene oxide (PEO).
18. The method of claim 13 wherein the patterning further comprises thinning, polishing or planarizing the second nano-imprint lithography substrate layer.
19. The method of claim 13 wherein the patterning further comprises forming a pattern having a plurality of features over the second nano-imprint lithography substrate and transferring the pattern into the second nano-imprint lithography substrate.
20. The method of claim 13 further comprising oxidizing the second nanoimprint lithography substrate layer prior to patterning.