Extrusion reduction in imprint lithography
View Patent ↗Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
1. A method comprising:
patterning a mesa of an imprint lithography template with patterned features and a first maze pattern distinct from the patterned features, said first maze pattern comprising an array of depressed or protruding spaced apart features positioned at the boundary of the mesa to surround said patterned features, and said array comprising multiple rows of said spaced apart features, wherein spaced apart features of at least one row are aligned or staggered with respect to spaced apart features of an adjacent row, and wherein at least one of said multiple rows surrounds at least one other of said multiple rows and is positioned closer to the mesa boundary;
dispensing polymerizable material on a substrate; and,
contacting the mesa of the imprint lithography template with the polymerizable material on the substrate,
wherein the first maze pattern reduces and slows propagation of the polymerizable material beyond the mesa boundary during said contacting.
2. The method of claim 1 , wherein the array of features comprises geometric shapes, fanciful shapes, or combinations thereof.
3. The method of claim 1 , wherein the array of features further comprises periodic arrays of squares having a width of approximately 2 microns, a length of approximately 2 microns, and a height of approximately 80-120 nm.
4. The method of claim 1 , wherein the features are spaced apart by a distance of between approximately 0.6 to 0.8 microns.
5. The method of claim 1 , wherein the first maze pattern forms a moat positioned outside of the first maze pattern at the boundary of the mesa.
6. The method of claim 5 , further comprising patterning a second maze pattern on the mesa, wherein the second maze pattern is positioned in the moat.