Imprinting of partial fields at the edge of the wafer
View Patent ↗Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate.
1. A method of edge field patterning on a substrate using an imprint lithography system, comprising:
positioning an imprint lithography template with the substrate such that a portion of the imprint lithography template is in superimposition with the substrate, the imprint lithography template having multiple mesas with each mesa corresponding to a field on the substrate, wherein a portion of the fields on the substrate are full fields and a portion of the fields on the substrate are partial fields;
depositing polymerizable material between the imprint lithography template and each full field in superimposition with the imprint lithography template;
depositing a non-reactive liquid between the imprint lithography template and each partial field in superimposition with the imprint lithography template;
positioning the imprint lithography template toward the substrate;
solidifying the polymerizable material to provide an edge field pattern on the substrate.
2. The method of claim 1 , wherein solidifying the polymerizable material to provide an edge field pattern on the substrate further comprises forming a stepped imprint boundary.
3. The method of claim 1 , wherein the fluid area of each partial field in superimposition with the imprint lithography template is defined by the mesa and an edge of the substrate.
4. The method of claim 1 , further comprising applying a transfer layer to the substrate prior to depositing the polymerizable material, wherein the transfer layer is used as an adhesion promoter.
5. The method of claim 4 , wherein the transfer layer deposited on the substrate is without an edge bead.
6. The method of claim 4 , further comprising removing an edge bead from the transfer layer.
7. The method of claim 4 , wherein the transfer layer comprises an optically imagable material.
8. The method of claim 4 , wherein the transfer layer comprises a positive tone resist.
9. The method of claim 4 , wherein the transfer layer comprises a negative tone resist.
10. The method of claim 1 , further comprising removing the imprint lithography template and positioning a second imprint lithography template towards the substrate, the second imprint lithography template having multiple mesas with each mesa corresponding to at least one partial field of the substrate.
11. The method of claim 10 , wherein the pattern density of the second imprint lithography template is similar to the pattern density of the imprint lithography template.
12. The method of claim 11 , wherein features of the second imprint lithography template are greater than approximately 400 nm.
13. The method of claim 1 , wherein depositing polymerizable material between the imprint lithography template and each full field in superimposition with the imprint lithography template includes minimizing wetting of portions of the imprint lithography template not in superimposition with the substrate.
14. A method of edge field patterning on a substrate using an imprint lithography system, comprising:
positioning an imprint lithography template in superimposition with the substrate such that a portion of fields on the substrate are classified as full fields and a portion of the fields on the substrate are classified as partial fields, the imprint lithography template having multiple mesas, each mesa corresponding to at least one field on the substrate;
depositing polymerizable material between the imprint lithography template and each full field in superimposition with the imprint lithography template;
depositing non-reactive liquid between the imprint lithography template and each partial field in superimposition with the imprint lithography template;
contacting the imprint lithography template to the polymerizable material; and,
solidifying the polymerizable material to provide an edge field pattern on at least one full field of the substrate.
15. The method of claim 14 , further comprising applying a transfer layer to the substrate prior to depositing the polymerizable material and non-reactive liquid, wherein the transfer layer is used as an adhesion promoter.
16. The method of claim 15 , wherein the transfer layer is deposited without an edge bead.
17. The method of claim 15 , further comprising removing an edge bead from the transfer layer.
18. A method comprising:
depositing a transfer layer on a substrate positioned within an imprint lithography system;
depositing polymerizable material between full fields of the substrate and an imprint lithography template in superimposition with the substrate, the imprint lithography template having multiple mesas;
depositing non-reactive liquid between partial fields of the substrate and the imprint lithography template in superimposition with the substrate;
contacting the imprint lithography template to the polymerizable material; and,
solidifying the polymerizable material to provide an edge field pattern on at least one full field of the substrate.
19. The method of claim 18 , further comprising applying a transfer layer without an edge bead to the substrate prior to depositing the polymerizable material and non-reactive liquid, wherein the transfer layer is used as an adhesion promoter.