Imprint lithography system and method
View Patent ↗A loading unit, surface scanning module, and an imprint module may be integrated into a single tool. Template may be loaded on loading unit and positioned within imprint module. Substrate may then be loaded on loading unit and scanned defects using surface scanning module. If substrate passes inspection by surface scanning module, substrate may be positioned imprint module where formable material may be dispensed thereon and imprinted. The imprinted substrate may then be unloaded from imprinting module.
1. A method for patterning a substrate using an imprint lithography template, comprising:
positioning the imprint lithography template on a loading port;
unloading the imprint lithography template from the loading port to an imprinting module, wherein unloading includes positioning the imprint lithography template on a template chuck within the imprinting module;
positioning a substrate on the loading port;
scanning a surface of the substrate for particles and defects using a surface scanning module;
positioning the substrate in superimposition with the template within the imprinting module;
patterning at least one field of the substrate; and,
unloading the substrate from the loading port, wherein the loading port, surface scanning module, and imprint module are integrated in a single imprinting station reducing exposure of the imprint lithography template and substrate to particles.
2. The method of claim 1 , further comprising:
determining a threshold amount for particle and defect presence on the surface of the substrate; and,
determining whether particles and defects provided by the scan exceed the threshold amount.
3. The method of claim 1 , wherein the template is a master template and the substrate is a replica template.
4. The method of claim 1 , wherein the template is a replica template.
5. The method of claim 1 , further comprising modulating shape of the template to conform to the substrate using a shape modulation control module.
6. The method of claim 5 , wherein the shape modulation control module is integrated in the single imprinting station.
7. The method of claim 1 , wherein the imprinting module includes a fluid dispense system.
8. The method of claim 7 , wherein patterning at least one field of the substrate includes:
depositing, by the fluid dispense system, formable material on the field of the substrate;
contacting the template to the formable material;
applying energy to the formable material to form a patterned layer on the substrate; and,
separating the template from the patterned layer.
9. The method of claim 1 , wherein scanning the surface of the substrate for particles and defects is immediately prior to positioning the substrate in superimposition with the template.
10. The method of claim 1 , wherein the substrate is a disk.
11. The method of claim 1 , wherein the substrate is a wafer.
12. The method of claim 1 , wherein the substrate is a solar cell.
13. A method of patterning a substrate using an imprint lithography template, comprising:
positioning the imprint lithography template on a loading port;
unloading the imprint lithography template from the loading port to an imprinting module, wherein unloading includes positioning the imprint lithography template on a template chuck within the imprinting module;
positioning a substrate on the loading port;
scanning a surface of the substrate for particles and defects using a surface scanning module;
positioning the substrate in superimposition with the template within the imprinting module;
patterning the substrate using a step and repeat process; and,
unloading the substrate from the loading port, wherein the loading port, surface scanning module, and imprint module are integrated in a single imprinting station reducing exposure of the imprint lithography template and substrate to particles.
14. The method of claim 13 , further comprising:
determining a threshold amount for particle and defect presence on the surface of the substrate; and,
determining whether particles and defects provided by the scan exceed the threshold amount.
15. The method of claim 13 , wherein the template is a master template and the substrate is a replica template.
16. The method of claim 13 , wherein the template is a replica template.
17. The method of claim 1 , wherein the imprinting module includes a fluid dispense system.
18. The method of claim 17 , wherein patterning at least one field of the substrate includes:
depositing, by the fluid dispense system, formable material on the field of the substrate;
contacting the template to the formable material;
applying energy to the formable material to form a patterned layer on the substrate; and,
separating the template from the patterned layer.
19. A method of patterning a substrate using an imprint lithography template, comprising:
loading the imprint lithography template on a first sub-assembly module;
inspecting the imprint lithography template using a second sub-assembly module;
unloading the imprint lithography template from the first sub-assembly module to the third sub-assembly module;
loading the substrate on the first sub-assembly module;
inspecting the substrate using the second sub-assembly module; and
patterning the substrate using the imprint lithography template within the third sub-assembly module, wherein the first sub-assembly module, the second sub-assembly module, and the third sub-assembly module are a single imprinting station.
20. The method of claim 19 , wherein the first sub-assembly module is a loading port, the second sub-assembly module is a surface scanning module, and the third sub-assembly module is an imprinting module.